This paper describes a thermodynamic model for the chemical vapour deposition of metal films. The values of the equilibrium mole fractions, the metal mole flux, and the deposition rate were calculated. This dependences are discussed for the nornial pressure and low pressure tantalum deposition. Experimental values are reported and compared with theoretical results.
I m vorliegenden Artikel wird fur die CVD-Metallabscheidung ein therrnodynamischcsModel1 zur Berechnung der Gleichgewichtsmolenbruche, des Metallniolenflusses und der Abscheiderate vorgestellt. Am Beispiel der Normal-und Niederdruck-Tantal-Abscheidung werden die berechneten Abhiingigkeiten diskutiert. F u r die Abscheiderate erfolgt ein Vergleich zwischen theoretischen und experimentell gefundenen Zusammenhangen.
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