We have studied the dependence of the absorption edge and the refractive index of wurtzite AlxGa1−xN films on temperature and composition using transmission and photothermal deflection spectroscopy. The Al molar fraction of the AlxGa1−xN films grown by plasma induced molecular beam epitaxy was varied through the entire range of composition (0⩽x⩽1). We determined the absorption edges of AlxGa1−xN films and a bowing parameter of 1.3±0.2 eV. The refractive index in the photon energy range between 1 and 5.5 eV and temperatures between 7 and 295 K was deduced from the interference fringes. The static refractive index n(0) changed from 2.29 for GaN to 1.96 for AlN at room temperature. A variation of temperature from 295 to 7 K resulted in a decrease of refractive index (at photon energies close to the band gap) by 0.05±0.01 and in an energy shift of the absorption edge of about 64±5 meV independent of the Al content of the films. Using the Kramers–Kronig dispersion relation and an approximation for the dispersion coefficient for photon energies near the band gap, the refractive index could be described as a function of photon energy, Al content, and temperature.

Al x Ga 1−x N alloys were grown on c-plane sapphire by plasma-induced molecular beam epitaxy. The Al content x was varied over the whole composition range (0⩽x⩽1). The molar Al fraction was deduced from x-ray diffraction and for comparison by elastic recoil detection analysis. The composition of the alloys calculated from the lattice parameter c underestimates x. This is due to a deformation of the unit cell. The exact Al mole fraction and the biaxial strain of the alloys can be calculated by an additional determination of a, using asymmetric reflections. The results obtained by x-ray diffraction and elastic recoil detection provide evidence for the validity of Vegard’s law in the AlGaN system. In addition, the deviation of the band gap from a linear dependence on x was investigated. We found a downward bowing with a bowing parameter b=1.3 eV.

To determine the sound velocity in wurtzite AlxGa1−xN, we have used surface acoustic-wave (SAW) delay lines on AlxGa1−xN/c-Al2O3. AlxGa1−xN films with compositions from x=0 to x=1 were grown by plasma-induced molecular beam epitaxy. Starting from published data, we fine tuned the values of the elastic moduli used in numerical calculations such that the simulated and measured dispersion of the SAW were in good agreement. Based on these values, the surface and bulk acoustic-wave velocities of single-crystal AlxGa1−xN were determined as functions of the composition. The resulting SAW velocities ranged from 3700 to 5760 m/s for GaN and AlN, respectively.

The influence of biaxial stress on the optical properties of thin GaN films is studied by x-ray diffraction and Raman and photoluminescence spectroscopy. The stress is caused by differences in the thermal expansion coefficient and lattice mismatch between the film and c-plane sapphire substrates. In particular, the influence of various thicknesses of AlN buffer layers on the strain in GaN films is studied. GaN/AlN films were deposited by low pressure metal organic chemical vapor deposition using triethylgallium and tritertbutylaluminum and ammonia. We observe a pronounced reduction of strain in the GaN films with increasing buffer thickness: An AlN buffer layer thicker than 200 nm eliminates the stress completely. Estimates of the linear coefficient for the near band gap luminescence shift due to biaxial compressive strain yield a value of 24 meV/GPa.

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Patterned etching of GaN films was achieved with laser-induced thermal decomposition. High-energy laser pulses are used to locally heat the film above 900 °C, causing rapid nitrogen effusion. Excess gallium is then removed by conventional etching. At exposures of 0.4 J/cm2 with 355 nm light, etch rates of 50–70 nm per pulse were obtained. Illumination with an interference grating was used to produce trenches as narrow as 100 nm.

The role of hydrogen in gallium nitride was studied on thin films of GaN on sapphire prepared at substrate temperatures in the range of 600 to 1100 °C. By using triethylgallium and ammonia as precursor and hydrogen and/or nitrogen as transport gases, we have observed a strong influence of molecular hydrogen on the deposition rate and the structural properties of epitaxial GaN. By elastic recoil detection analysis and thermal desorption measurements we were able to determine the total concentration of nitrogen, hydrogen and carbon in the bulk material. Isotope substitution of hydrogen by deuterium in the H2 carrier gas did not give rise to a noticeable deuterium incorporation, showing that the sources for hydrogen are the metalorganic precursor, ammonia or reaction products of both. Once incorporated, thermally activated hydrogen effusion from n‐type GaN occurs with an activation energy of more than 3.9 eV. With the help of mass spectrometry we established hydrogen effusion from heavily magnesium‐doped (2 at%) GaN at temperatures between 600 and 700 °C, which is the temperature range used for acceptor activation.