TiN films with various nitrogen content were deposited using reactive magnetron sputtering system and the influence of TiN film's microstructure on thermal diffusivity was investigated. The results showed that the titanium nitride film with 40.6-64.0at.% N exhibited a single face-centered cubic (fcc) structure. The density of states calculations of TiNx showed that excess N atoms in TiN matrix weaken the Ti-N bonds. The thermal diffusivity of TiN thin films decreased gradually and reached a stable range with an increase of N content. The minimum thermal diffusivity value was 2.291×10 −6 m 2 /s at 60.2at.% N. This reduction of thermal diffusivity could be attribute to the films' microstructure, including the increased grain boundaries due to the decrease of grain size, the change of preferential orientation and the increased lattice distortion.
Isothermal and non-isothermal crystallization kinetics of polycyclohexylene dimethylene cyclohexanedicarboxylate (PCCE) were investigated via differential scanning calorimetry (DSC). Isothermal melt crystallization kinetics were analyzed using the traditional Avrami equation. Non-isothermal melt crystallization kinetics data obtained from DSC were analyzed using the extended Avrami relation and a combination of the Avrami equation and the Ozawa relationship. The glass transition temperature, equilibrium melting point, isothermal crystallization activation energy, and non-isothermal crystallization activation energy were determined. Furthermore, a predictive method based on the Nakamura model was proposed and was used to describe the non-isothermal crystallization kinetics based on the isothermal experimental data. The results suggested that the original Nakamura equation was not successful in describing the non-isothermal crystallization of PCCE over a wide range of cooling rates. It was found that the non-isothermal crystallization kinetics of PCCE, over a wide range of cooling rates, could best be described by modifying the differential Nakamura equation to include a varied Avrami index.
Ti-Al-Mo-N composite films with different molybdenum content were deposited by reactive magnetron sputtering. The results showed that the films consisted of fcc-(Ti, Al, Mo) N substitutional solid solution within 8.2 at.-% Mo. The films consisted of two phases which were fcc-(Ti, Al, Mo) N substitutional solid solution and fcc-Mo 2 N at 27.7-49.4 at.-% Mo. The hardness increased slowly at 0-27.7 at.-% Mo and then increased rapidly at above 27.7 at.-% Mo. A ball-on-disc dry sliding test was conducted on films deposited on stainless-steel substrates. The friction coefficient quickly decreased within 8.2 at.-% Mo and then gently declined at 8.2-49.4 at.-% Mo. The value of wear rate remained quite constant for compositions in the range 0-34.3 at.-% Mo and then dropped quickly at 34.3-49.4 at.-% Mo. The addition of Mo content effectively improved the hardness and tribological properties of the films.
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