The microwave-based plasma treatment facility at the Central University of Punjab Bathinda (CUPB) based on 2.45 GHz has been used to investigate the impact on the electrochemical performance of TiO2. This was accomplished by treating a number of pellets of TiO2 sample material with microwave plasma at an input power of 80 W. The palette is subjected to microwave plasma treatment at 30-, 60-, 80-, and 100-s intervals. Many such characterization methods, including UV-visible spectroscopy, FTIR, XRD, and FESEM, have been applied to the study of the impact of plasma treatment on other physical and chemical properties in the context of untreated pellets. In the 80-s plasma treatment, the FTIR study showed that the (O-Ti-O) vibration band at 500–900 cm−1 was wider than other bands. The UV results showed that an 80-s plasma treatment decreased the sample’s band gap by 37% and increased the amount of disordered, amorphous material in the sample that had not been treated. XRD studies show that a sample that was treated with plasma for 80 s has low crystallinity and a high disorder (amorphous) factor. The Nyquist plot showed that the electrochemical charge transfer resistance drops from 7 (not treated) to 4 after 80 s of plasma treatment. In a study of electrochemical performance, a sample that was treated with plasma for 80 s has a capacitance that is 35% higher than a sample that was not treated.
The microwave plasma diagnosis in-situ irradiation system
has been developed at the Central University of Punjab,
Bathinda. The final design is achieved by a combination of
analytical and simulation methods using CST and Comsol Multiphysics
software. Simulations outcome reveals the electric field profile at
the center of the microwave plasma chamber is strong and dense. A
strong electric field profile inside the microwave cavity has been
verified by the confinement of the plasma in the absence of an
external magnetic field. The magnetic field profile for the
2450 MHz microwave facility is simulated and confirmed
experimentally. Different RF powers and working gas pressures have
been used with Langmuir probes to record the plasma signal. As a
second stage, we studied the practicality of using a plasma cavity
to treat materials with plasma for materials science experiment in
plasma environment. This work shows the results of a thorough
computational analysis of a microwave plasma source that has been
tested in lab.
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