On-chip direct coupling of dielectric waveguides to Si substrate-integrated photodetectors has been realized within a top-down approach. A first-run 44% external quantum efficiency at 850 nm is shown for an oxynitride photonic integrated circuit at room temperature.
The development of versatile and novel material platforms for integrated photonics is of prime importance in the perspective of future applications of photonic integrated circuits for quantum information and sensing. Here we present a low-loss material platform based on high-refractive index silicon oxynitride (SiON), which offers significant characteristics for linear and non-linear optics applications in a wide range of red/near-infrared wavelengths. The demonstrated propagation loss <1.5 dB/cm for visible wavelengths enables the realization of long and intricate circuitry for photon manipulations, as well as the realization of high quality factor resonators. In addition, the proposed SiON shows a high nonlinear index of 10−19 m2/W, improving the strength of nonlinear effects exploitable for on-chip photon generation schemes.
Mitigation of optical losses is of prime importance for the performance of integrated microphotonic devices. In this paper, we demonstrate strip-loaded guiding optical components realized on a 27 nm ultra-thin SOI platform. The absence of physically etched boundaries within the guiding core suppresses majorly the scattering loss, as shown by us previously for a silicon nitride (Si3N4) platform [Stefan et. al., OL 40, 3316 (2015)]. Unexpectedly, the freshly fabricated Si devices showed large losses of 5 dB/cm, originating from absorption by free carriers, accumulated under the positively charged Si3N4 loading layer. We use 254 nm ultraviolet (UV) light exposures to neutralize progressively and permanently silicon nitride's bulk charge associated with diamagnetic K+ defects. This in turn leads to a net decrease of electron concentration in the SOI layer, reducing thus the propagation loss down to 0.9 dB/cm. Detailed MOS-capacitance measurements on test samples were performed to monitor the UV-induced modification of the electronic properties of the system. The evolution of loss mitigation was directly monitored both by Beer-Lambert approach in waveguide transmission experiments, as well as through more accurate cavity linewidth measurements. In the last case, we demonstrate how intrinsic cavity Q's boost from 60,0000 to up to 500,000 after UV treatment. Our results may open routes towards engineering of new functionalities in photonic devices employing UV-modification of space charges and associated local electric fields, unveil the origin of induced optical nonlinearities in Si3N4/Si micro-photonic systems, as well as envisage possible integration of these with ultra-thin SOI electronics.
The development of versatile and novel material platforms for integrated photonics is of prime importance in the perspective of future applications of photonic integrated circuits for quantum information and sensing. Here we present a low-loss material platform based on high-refractive index silicon oxynitride (SiON), which offers significant characteristics for linear and non-linear optics applications in a wide range of red/near-infrared wavelengths. The demonstrated propagation loss < 1.5 dB/cm for visible wavelengths enables the realization of long and intricate circuitry for photon manipulations, as well as the realization of high quality factor resonators. In addition, the proposed SiON shows a high nonlinear coefficient of 10 −19 m 2 /W, improving the strength of nonlinear effects exploitable for on-chip photon generation schemes.
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