The outstanding feature of materials research in the eighties has been the convergence of basic research and practical application, leading to ever shorter cycles of innovation. This is especially true of materials which form the basis of key technologies. The mass storage units of the next generations of computers will be based on optical processes having a storage density which exceeds that of all hitherto known storage techniques that are practicable from the technical standpoint. In view of the fact that since 1982 read-only memories in the form of compact discs (CD-ROM) have become very successful in the field of audio electronics, research and development are now concentrated on materials for write-once (WORM) and erasable (EDRAW) storage systems. Suitable materials for optical data storage are substances in which data markings can be recorded and deleted respectively using semiconductor lasers. Materials development is centered on the synthesis of infrared-absorbing dyes for WORM memories and the production of rare earth/transition metal alloys for magneto-optical data recording. An introduction to CD-ROM technology will be followed by an overview of the state of development of the most important storage materials which are currently available commercially, and then the properties of these materials will be discussed with reference to selected examples.

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Die bislang unbekannten peripher substituierten trans-Dihalogeno(tetra-tert-butylphthalocyaninato)metall-IVB-Derivate 5a, b und 6a, b sowie trans-Dichloro[tetrakis(trimethylsilyl)phthalocyaninato]germanium (6c) wurden durch Umsetzung mit verschiedenen 1-Alkinyl-Grignardverbindungen 9a -e in die monomeren trans-Di-l-alkinyl(tetra-tert-butylphtha1ocyaninato)-metall-IVB-Derivate 10a -h bzw. trans-Di-l-alkinyl[tetrakis(trimethylsilyl)phthalocyaninato]-germanium-Derivate 1Oi -I ubergefuhrt. Die gute Loslichkeit aller Produkte und der starke, auf die axial gebundenen Liganden wirkende Ringstromeffekt des Makrocyclus sind bemerkenswert.Die formal analoge Umsetzung mit der zweizahnigen Ethindiyldi-Grignardverbindung 9f fuhrt zu den acetylenverbruckten Polymeren 12a -c. Diese sind Modellsubstanzen fur einen von uns vorgeschlagenen neuartigen Typ eines eindimensionalen Leiters. Soluble trans-Di-1-alkynyl-and Poly-trans-ethynyl(tetraalkylphthalocyaninato)me~l IVB DerivativesThe hitherto unknown peripheric substituted trans-dihalogeno(tetra-?erf-butylphthalocyaninato)-metal IVB derivatives 5a, b and 6a, b as well as trans-dichloro[tetrakis(trimethylsilyl)phthalocyaninato]germanium (6c) were converted into the monomeric, soluble trans-di-1 -alkynyl(tetratert-butylphtha1ocyaninato)metal IVB compounds 10a -h and trans-di-1-alkynyl[tetrakis(trimethylsilyl)phthalocyaninato]germanium compounds 1Oi -1, respectively, by the reaction with various 1-alkynyl Grignard derivatives 9a -e. The high solubility of all products in organic solvents and the strong ring-current effect of the macrocycle on the axial ligands are remarkable. The formally analogous reaction with the bidentate ethynediyldi-Grignard compound 9f leads to the soluble, acetylene-bridged polymers 12a -c. These are considered as model compounds for a new kind of one-dimensional conductors proposed by us.Vor einiger Zeit stellten wir ein Konzept fur einen neuen organischen Leiter vor '), bei dem makrocyclische Metallkomplexe uber Bruckenliganden zu polymeren Strukturen verknupft sind. Das Strukturkonzept zeichnet sich durch eine grooe Variationsbreite hinsichtlich der erforderlichen Komponenten -Zentralmetall, Makrocyclus und Briickenligand -aus. EHMO-Berechnungen zu einem Modellsystem haben ergeben'), da13 beim Ubergang vom Monomeren zum Polymeren mit einer erheblichen Steigerung der elektrischen Leitfahigkeit entlang der Polymerenachse zu rechnen ist.Obwohl es bisher lediglich gelungen ist, monomere Modellsubstanzen des berechneten Polymeren zu synthetisieren 3), haben erste Untersuchungen an strukturell ahnli-0

The lithographic performance of pigmented photoresists for color filter production is affected by the structure of the employed polymer. Four polymers with acrylate backbones and pendant reactive acrylate/methacrylate groups were prepared, and the effects of their molecular weights and acid values on the pixel pattern quality, development time, sensitivity and development mode were elucidated. ECHIPTM, a statistical experimental design program was used for optimization studies revealing that the red resist performs best, when polymers with relatively low acid values (<40 mg KOH/g polymer) and high molecular weights >50,000 are used. The green and the blue resists yielded optimal patterns at molecular weights in the range of 20,000–30,000 with acid values of about 50–60 mg KOH/g polymer. The sensitivity of resists containing polymers with pendant acryloyl groups is in general higher than that of the corresponding methacryloyl derivatives. Polymers having butyl acrylate-methacrylic acid backbone units showed the highest sensitivity among the polymers investigated. When developed with an optimized tetramethyl ammonium hydroxide (TMAH) based developer, resists using polymers with methyl methacrylate units showed peeling type development, while butyl acrylate copolymers effected homogeneous dissolution yielding higher resolution.

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