This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produced by evanescent coupling through the air-gap. We demonstrate that a plasmonic optical head achieves a patterning resolution of 70 nm and a patterning speed of 100 mm/s. The proposed combination of a surface plasmon nanoaperture and a nanogap servo system is one of the strategies used to achieve high-speed, high-resolution nanolithography.
Nano-crystalline CeO2 was synthesized by the mechanical milling and subsequent heat-treatment from the mixture of Ce(OH)4 as precursor, and NaCl as diluent. The diluent provided diffusion barrier during milling and heat-treatment, which was easily dissolved out by deionized water. The size of crystallite and the strain variance of CeO2 were depended on the temperature and heat-treatment time: increased with the temperature (400~700oC) and time (1~24 hours) increasing, and saturated near at 20nm in size owing to the densification of diluent. The synthesized nano-crystalline CeO2 powder was applied as an abrasive in CMP (Chemical Mechanical Planarization) slurry. When blanket-type SiO2 and Si3N4 wafers were polished with the slurries, the removal rates (RR) of SiO2 and Si3N4 wafers and selectivities (RRSiO2/RRSi3N4) were influenced by synthetic condition of abrasive, the suspension stability and the pHs of slurries.
In this paper, we report the enhancement of resolution of continuous wave (CW) stimulated emission depletion (STED) microscopy by a novel method of structured illumination of an excitation beam. Illumination by multiple excitation beams through the specific pupil apertures with high in-plane wave vectors leads to interference of diffracted light flux near the focal plane, resulting in the contraction of the point spread function (PSF) of the excitation. Light spot reduction by the suggested standing wave (SW) illumination method contributes to make up much lower depletion efficiency of the CW STED microscopy than that of the pulsed STED method. First, theoretical analysis showed that the full width at half maximum (FWHM) of the effective PSF on the detection plane is expected to be smaller than 25% of that of conventional CW STED. Second, through the simulation, it was elucidated that both the donut-shaped PSF of the depletion beam and the confocal optics suppress undesired contribution of sidelobes of the PSF by the SW illumination to the effective PSF of the STED system. Finally, through the imaging experiment on 40-nm fluorescent beads with the developed SW-CW STED microscopy system, we obtained the result which follows the overall tendency from the simulation in the aspects of resolution improvement and reduction of sidelobes. Based on the obtained result, we expect that the proposed method can become one of the strategies to enhance the resolution of the CW STED microscopy.
We propose dual-wavelength Fourier ptychography for topographic measurement. To extend the axial measurement range, a single light-emitting diode (LED) and two appropriate bandpass filters are employed. This provides a speckle-free phase image, and reduces the possibility of a systematic error, which yields a high-quality topographic image. The proposed system can measure the surface topography in the range of nano- to micro-structures. The performance of the system is experimentally verified.
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