The effects of the stoichiometry of the Si-rich oxide (SRO) layer, O/Si ratio, on the structural and optical properties of SRO/SiO2 multilayer films were investigated in this work. SRO/SiO2 multilayer films with different O/Si ratios were grown by a co-sputtering technique, and Si quantum dots (QDs) were formed with post-deposition annealing. By transmission electron microscopy (TEM) and glancing incidence x-ray diffraction (GIXRD), it was found that the Si QD size decreases with increases in O/Si ratio. The photoluminescence (PL) spectrum varies with the O/Si ratio in band position, shape and intensity. In addition, it was observed that the absorption edge blue-shifts with increases in the O/Si ratio. The change in the absorption edge is consistent with strengthening quantum confinement effects in Si QDs, as indicated by TEM and GIXRD. The optical properties were also investigated by 2D photoluminescence excitation (2D-PLE) and lifetime measurements. The origin of emission and absorption is discussed based on the absorption, PL, 2D-PLE and decay time measurements.

The influence of hydrogen rate on optical properties of silicon nanocrystals deposited by sputtering method was studied by means of time-resolved photoluminescence spectroscopy as well as transmission and reflection measurements. It was found that photoluminescence decay is strongly non-single exponential and can be described by the stretched exponential function. It was also shown that effective decay rate probability density function may be recovered by means of Stehfest algorithm. Moreover, it was proposed that the observed broadening of obtained decay rate distributions reflects the disorder in the samples.

The effect of silicon concentration and annealing temperature on terbium luminescence was investigated for thin silicon rich silicon oxide films. The structures were deposited by means of plasma enhanced chemical vapor deposition. The structural properties of these films were investigated by Rutherford backscattering spectrometry, transmission electron microscopy and Raman scattering. The optical properties were investigated by means of photoluminescence and photoluminescence decay spectroscopy. It was found that both the silicon concentration in the film and the annealing temperature have a strong impact on the terbium emission intensity. In this paper, we present a detailed discussion of these issues and determine the optimal silicon concentration and annealing temperature.

Silicon nanocrystals embedded in an oxide matrix formed in a multilayer architecture were deposited by the magnetron sputtering method. By means of Raman spectroscopy we have found that compressive stress is exerted on the silicon nanocrystal core. The stress varies as a function of silicon concentration (O/Si ratio) in the silicon-rich oxide (SRO) layers, which can be attributed to the changing nanocrystal environment. By conducting the time-resolved spectroscopy experiment, we demonstrate that, depending on the nanocrystal surroundings, a different amount of nonradiative recombination sites participates in the excited carrier relaxation process, leading to changes of the relative quantum yield of photoluminescence.

We demonstrate the effect of air exposure on optical and electrical properties of ZnMgO nanoparticles (NPs) typically exploited as an electron transport layer in Cd-based quantum-dot light-emitting diodes (QLEDs). We analyze the roles of air components in modifying the electrical properties of ZnMgO NPs, which reveals that H 2 O enables the reduction of hole leakage while O 2 alters the character of charge transport due to its ability to trap electrons. As a result, the charge balance in the QDs layer is improved, which is confirmed by voltage-dependent measurements of photoluminescence quantum yield. The maximum external quantum efficiency is improved over 2-fold and reaches the value of 9.5% at a luminance of 10 4 cd/m 2 . In addition, we investigate the problem of electron leakage into the hole transport layer and show that trap-mediated electron transport in the ZnMgO layer caused by adsorbed O 2 ensures a higher leakage threshold. This work also provides an insight into the possible disadvantages of device contact with air as well as problems and challenges that might occur during open-air fabrication of QLEDs.

Silicon nanocrystals embedded in a silicon oxide matrix were deposited by radio frequency reactive magnetron sputtering. By means of Raman spectroscopy, we have found that a compressive stress is exerted on the silicon nanocrystal cores. The stress varies as a function of silicon concentration in the silicon-rich silicon oxide layers varies, which can be attributed to changes of nanocrystal environment. By conducting the Fourier transform infrared absorption experiments, we have correlated the stresses exerted on the nanocrystal core to the degree of matrix structural order.PACS78.67.Bf, 78.67.Pt, 73.63.Bd, 78.47.D, 74.25.Nd

In this paper, we investigate non-single exponential photoluminescence decays in various disordered condensed-matter systems. For such materials, two formulas for the average lifetime of system’s excited state are commonly used in the analysis of experimental data. In many cases, the choice of formula is arbitrary and lacks a clear physical justification. For this reason, our main goal is to show that the choice of correct mathematical formula should be based on the interpretation of measured photoluminescence decay curve. It is shown that depending on the investigated system, after appropriate normalization, photoluminescence decay curve can represent either a survival probability function or a probability density function of lifetime and for this reason two different formulas for the average lifetime are required. It is also shown that, depending on luminescence quantum yield, some information on the probability density function of lifetime can be lost in the process of measurement, which results in underestimated values of average lifetime. Finally, we provide an interpretation of total decay rate distributions which are frequently obtained by phenomenological modeling of non-single exponential photoluminescence decays.

The Nd-nanocluster coupling strength and its effect in excitation/de-excitation of Nd 3+ luminescence in Nddoped silicon-rich silicon oxide Appl. Phys. Lett. 83, 2778Lett. 83, (2003 We report on the microstructure and photoluminescence ͑PL͒ properties of Nd-doped SiO 2 thin films containing silicon nanoparticles ͑Si-np͒ as a function of the annealing temperature and the Nd concentration. The thin films, which were grown on Si substrates by reactive magnetron co-sputtering, contain the same Si excess. Fourier transform infrared ͑FTIR͒ spectra show that a phase separation occurs during the annealing due to the agglomeration of the Si excess resulting in the formation of Si-np. Besides, after annealing, the films exhibit PL from excitonic states confined in Si-np. We showed that the intensity of the PL of Nd 3+ ions that occurs at ϳ0.92, 1.06, and 1.4 m is maximal at low Nd concentration and while well-passivated Si-np are formed. FTIR and x-ray measurements showed that the increase in the Nd incorporation has detrimental effects on the PL of Nd 3+ because of the formation of Nd 2 O 3 nanocrystals and inherent disorder in the SiO 2 host matrix. PL excitation measurements demonstrate that the PL of Nd 3+ ions is nonresonant and follows the excitation of Si-np giving new evidence of the energy transfer from Si-np toward the rare earth ions.