2009
DOI: 10.1088/0957-4484/20/48/485703
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Effects of Si-rich oxide layer stoichiometry on the structural and optical properties of Si QD/SiO2multilayer films

Abstract: The effects of the stoichiometry of the Si-rich oxide (SRO) layer, O/Si ratio, on the structural and optical properties of SRO/SiO2 multilayer films were investigated in this work. SRO/SiO2 multilayer films with different O/Si ratios were grown by a co-sputtering technique, and Si quantum dots (QDs) were formed with post-deposition annealing. By transmission electron microscopy (TEM) and glancing incidence x-ray diffraction (GIXRD), it was found that the Si QD size decreases with increases in O/Si ratio. The p… Show more

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Cited by 100 publications
(68 citation statements)
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“…At forward bias (FB) (positive voltage to FTO contact respect to Si substrate), the SRN-LEC shows a broad spectrum with the maximum emission centered at around 580 nm, and it remains at the same wavelengths for diferent voltages as shown in Figure 7(a). This luminescence has been reported as a characteristic behavior of defect-related EL [67]. In fact, the luminescent properties of SRN ilms in this chapter are related to the presence of defects.…”
Section: Electroluminescencementioning
confidence: 58%
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“…At forward bias (FB) (positive voltage to FTO contact respect to Si substrate), the SRN-LEC shows a broad spectrum with the maximum emission centered at around 580 nm, and it remains at the same wavelengths for diferent voltages as shown in Figure 7(a). This luminescence has been reported as a characteristic behavior of defect-related EL [67]. In fact, the luminescent properties of SRN ilms in this chapter are related to the presence of defects.…”
Section: Electroluminescencementioning
confidence: 58%
“…Nevertheless, when the silicon content is increased (M20), the PL band appears mainly at the red side of the spectrum. The redshift of the main PL peak (after thermal annealing) has been widely observed and ascribed to the agglomeration of silicon excess and a subsequent silicon nanoparticle formation as a result of thermal annealing process [67][68][69][70][71]. Nevertheless, some point defects are also present within the SRO ilms.…”
Section: Silicon-rich Oxide (Sro) Ilmmentioning
confidence: 99%
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“…Высокий коэффициент стехиометричности слоев МНС был получен за счет направленного введения молекулярного кислорода в рабочую камеру в процессе напыления -подхода, часто применяемого для управ-ления величиной x, в частности, в пленках SiO x [26,27]. Отметим, что ранее для отдельных слоев SiO x и МНС a-SiO x /SiO 2 использовались технологические режимы, Рис.…”
Section: результаты и их обсуждениеunclassified
“…Among them, Mn-doped ZnS nanocrystals have been receiving much attention due to their promising application in optoelectronic devices [8]. A large number of Mn-doped ZnS nanocrystals with simple morphologies, such as thin film, nanowires, and nanorods have been prepared by various techniques [9][10][11]. The most reports of Mn-doped ZnS focused on the emission due to 4 T 1 → 6 A 1 transition within the 3d shell of Mn 2+ .…”
Section: Introductionmentioning
confidence: 99%