The growth and structural properties of GaN/AlN core-shell nanowire heterostructures have been studied using a combination of resonant x-ray diffraction, Raman spectroscopy and high resolution transmission electron microscopy experiments. For a GaN core of 20 nm diameter on average surrounded by a homogeneous AlN shell, the built-in strain in GaN is found to agree with theoretical calculations performed using a valence force field model. It is then concluded that for an AlN thickness up to at least 12 nm both core and shell are in elastic equilibrium. However, in the case of an inhomogeneous growth of the AlN shell caused by the presence of steps on the sides of the GaN core, plastic relaxation is found to occur. Consistent with the presence of dislocations at the GaN/AlN interface, it is proposed that this plastic relaxation, especially efficient for AlN shell thickness above 3 nm, is promoted by the shear strain induced by the AlN inhomogeneity.

The structural and optical properties of InGaN/GaN nanowire heterostructures grown by plasma-assisted molecular beam epitaxy have been studied using a combination of transmission electron microscopy, electron tomography and photoluminescence spectroscopy. It is found that, depending on In content, the strain relaxation of InGaN may be elastic or plastic. Elastic relaxation results in a pronounced radial In content gradient. Plastic relaxation is associated with the formation of misfit dislocations at the InGaN/GaN interface or with cracks in the InGaN nanowire section. In all cases, a GaN shell was formed around the InGaN core, which is assigned to differences in In and Ga diffusion mean free paths.

International audienceSemiconductor nanowires have the potential to outperform two-dimensional structures, for instance for light-emitting applications. However, the intrinsic fundamental properties of heterostructures in nanowires still remain to be assessed and compared to their two-dimensional counterparts. We show that polar GaN/AlN axial heterostructures in nanowires grown by plasma-assisted molecular-beam epitaxy are subject to a clear quantum-confined Stark effect. However, the magnitude of this effect is smaller than for two-dimensional structures due to the reduction in piezoelectric polarization that occurs thanks to elastic relaxation which is favored by the nanowire free surfaces. Moreover, we show by temperature-dependent photoluminescence measurement and single-photon correlation measurements that these heterostructures behave like quantum dots

The electroluminescent properties of InGaN/GaN nanowire-based light emitting diodes (LEDs) are studied at different resolution scales. Axial one-dimensional heterostructures were grown by plasma-assisted molecular beam epitaxy (PAMBE) directly on a silicon (111) substrate and consist of the following sequentially deposited layers: n-type GaN, three undoped InGaN/GaN quantum wells, p-type AlGaN electron blocking layer and p-type GaN. From the macroscopic point of view, the devices emit light in the green spectral range (around 550 nm) under electrical injection. At 100 mA DC current, a 1 mm2 chip that integrates around 10(7) nanowires emits an output power on the order of 10 µW. However, the emission of the nanowire-based LED shows a spotty and polychromatic emission. By using a confocal microscope, we have been able to improve the spatial resolution of the optical characterizations down to the submicrometre scale that can be assessed to a single nanowire. Detailed μ-electroluminescent characterization (emission wavelength and output power) over a representative number of single nanowires provides new insights into the vertically integrated nanowire-based LED operation. By combining both μ-electroluminescent and μ-photoluminescent excitation, we have experimentally shown that electrical injection failure is the major source of losses in these nanowire-based LEDs.

We demonstrate the strong influence of strain on the morphology and In content of InGaN insertions in GaN nanowires, in agreement with theoretical predictions which establish that InGaN island nucleation on GaN nanowires may be energetically favorable, depending on In content and nanowire diameter. EDX analyses reveal In inhomogeneities between the successive dots but also along the growth direction within each dot, which is attributed to compositional pulling. Nanometer-resolved cathodoluminescence on single nanowires allowed us to probe the luminescence of single dots, revealing enhanced luminescence from the high In content top part with respect to the lower In content dot base.

We studied and improved gallium nitride (GaN) nanowire (NW) based light emitting diodes (LEDs). PIN nanodiodes with and without InGaN/GaN multiple quantum wells (MQWs) were grown by molecular beam epitaxy (MBE) under N-rich conditions on n-doped Si(111) substrates. Thanks to the coalescence of the p-type region of the NWs grown at low temperature, an autoplanarization process has been performed to obtain LEDs. Ni/Au top contacts have been deposited and patterned in order to bias the devices. A multiple-scale characterization approach has been carried out through the comparison of localized cathodoluminescence (CL) and macroscopic electroluminescence (EL) spectra. It shows that the EL emission of PIN-based LED at room temperature is related to defects in the p-type region of the NWs. In order to enhance the radiative recombinations of NW-based LEDs, we have first added InGaN/GaN MQWs, and secondly an electron blocking layer (EBL) has been inserted between the MQWs and the p-type zone of the NWs. The LED with EBL exhibited an emission band at 420 nm. The blue-shift of this emission band with increasing injected current is attributed to quantum confined Stark effect (QCSE) and evidences the radiative emission of InGaN/GaN MQWs. At 50 mA dc current, this improved NW-based LED emits about 500 times more light than the heterostructure without EBL.

GaN nanowires grown by plasma-assisted molecular beam epitaxy are of excellent optical quality, their optical signature being characteristic of homogeneous strain-free GaN. There are however discrepancies between the low temperature luminescence spectra of GaN thin films and nanowires, in particular, a strong emission line around 3.45 eV in nanowires is not found with such a large intensity in thin film GaN. The origin of this emission line in nanowires is still debated; in this article, we shed new light on this debate notably by polarization-resolved luminescence and magneto-luminescence experiments. Our findings demonstrate, in particular, that this line cannot be attributed to a two-electron satellite of the donor bound exciton transition. V

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