Fluorine doped ZnO thin films (FZO) are prepared onto glass substrates at 350 • C by the chemical spray pyrolysis technique. X-ray diffraction spectra show a polycrystalline of ZnO (wurtzite structure) where the amount of fluorine doping affects to preferential orientation (002 plane along c-axis) and does not vary the lattice parameters. Therefore, F introduction in lattice is by the substitution of O −2 ions by F −1 ions. Any variation is observed in transmittance and reflectance measurements in 400-2000 nm wavelength range when samples present F dopant; they have transmittance around 80% in the near infrared and visible zones. The FZO films are degenerate and exhibit n-type electrical conductivity. The best resistivity and mobility are 7.6 × 10 −3 Ω cm and 3.77 cm 2 V −1 s −1 respectively. The calculated values of the mean free path are very small compared to the grain sizes calculated using XRD measurements. Therefore, we suggest that ionized impurity and/or neutral impurity scattering are the dominant scattering mechanisms in these films.
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