Yb-doped ZnO thin films were prepared on glass substrates by spray pyrolysis technique in order to investigate the insertion of Yb ions in the ZnO matrix and the related optical properties of the films. The molar ratio of Yb in the spray solution was varied in the range of 0-5 at. %. X-ray diffraction patterns showed that the undoped and Yb-doped ZnO films exhibit the hexagonal wurtzite crystal structure with a preferential orientation along ͓002͔ direction. No secondary phase is observed in Yb-doped ZnO films. All films exhibit a transmittance between 75 and 90% in the visible range with a sharp absorption onset about 375 nm corresponding to the fundamental absorption edge at 3.3 eV. The photoluminescence measurements show a clear luminescence band at 980 nm that is characteristic of Yb 3+ transition between the electronic levels 2 F 5/2 and 2 F 7/2. This is an experimental evidence for an efficient energy transfer from ZnO matrix to Yb 3+. Hall effect measurements showed low resistivities and high carrier mobilities which makes these films of interest to photovoltaic devices.

Abstract. Neodymium-doped zinc oxide (NZO) thin films were deposited on glass substrates by spray pyrolysis technique. X-ray diffraction patterns have shown that both undoped and Nd-doped ZnO films exhibit the hexagonal wurtzite crystal structure with a preferential orientation along [0 0 2] direction. The effective doping concentration has been determined by Rutherford backscattering measurements showing that the neodymium is not incorporated easily into ZnO host matrix. The surface roughness was shown to increase with Nd doping. NZO films are highly transparent in the visible region. The lowest electrical resistivity value of about 4.0 10 −2 Ω cm was obtained for 1% Nd effective doping.

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Fluorine doped ZnO thin films (FZO) are prepared onto glass substrates at 350 • C by the chemical spray pyrolysis technique. X-ray diffraction spectra show a polycrystalline of ZnO (wurtzite structure) where the amount of fluorine doping affects to preferential orientation (002 plane along c-axis) and does not vary the lattice parameters. Therefore, F introduction in lattice is by the substitution of O −2 ions by F −1 ions. Any variation is observed in transmittance and reflectance measurements in 400-2000 nm wavelength range when samples present F dopant; they have transmittance around 80% in the near infrared and visible zones. The FZO films are degenerate and exhibit n-type electrical conductivity. The best resistivity and mobility are 7.6 × 10 −3 Ω cm and 3.77 cm 2 V −1 s −1 respectively. The calculated values of the mean free path are very small compared to the grain sizes calculated using XRD measurements. Therefore, we suggest that ionized impurity and/or neutral impurity scattering are the dominant scattering mechanisms in these films.