2D materials are interesting flat nanoplatforms for the implementation of different electrochemical processes, due to the high surface area and tunable electronic properties. 2D transition metal dichalcogenides (TMDs) can be produced through convenient top-down liquid-phase exfoliation (LPE) methods and present capacitive behaviour that can be exploited for energy storage applications. However, in their thermodynamically stable 2H crystalline phase, they present poor electrical conductivity, being this phase a purely semiconducting one. Combination with conducting polymers like polyaniline (PANI), into nanohybrids, can provide better properties for the scope. In this work, we report on the preparation of 2D WS2@PANI hybrid materials in which we exploit the LPE TMD nanoflakes as scaffolds, onto which induce the in-situ aniline polymerization and thus achieve porous architectures, with the help of surfactants and sodium chloride acting as templating agents. We characterize these species for their capacitive behaviour in neutral pH, achieving maximum specific capacitance of 160 F/g at a current density of 1 A/g, demonstrating the attractiveness of similar nanohybrids for future use in low-cost, easy-to-make supercapacitor devices.
Here, we demonstrate that oxide thin film devices could be affected by humidity in their in-plane stress and in substrate curvature. We prepared silica glass and ceria crystalline thin films on Si(100) wafers by the sol-gel method. Both films had “tensile” in-plane residual stress. We cycled the relative humidity between ca. 20% and 80% in the square wave and monitored the substrate curvature in situ, from which in-plane stress was calculated. The increase and decrease in humidity resulted in a decrease and an increase in tensile stress, respectively. In situ ellipsometric measurements during humidity cycles showed that both thickness and refractive index increase and decrease on the increase and decrease in humidity, respectively. This guarantees that the volume expansion and shrinkage caused by water molecule adsorption/absorption and desorption, respectively, are the origins of the response of the stress to humidity. Responding to the change in humidity, thicker silica glass films with low porosities of 1%–3% showed more sluggish change in stress, suggesting absorption/desorption of water via diffusion in siloxane network in such dense films. Silica glass films with a larger porosity showed more quick response to humidity, indicating adsorption/desorption on the pore wall as the primary cause of the response. “Compressive” stress in a silica glass film with ca. 1% porosity exhibited very slight response in stress to humidity, which was attributed to the hard diffusion of water in compressed siloxane network.
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