Three types of 5-mask TFT array process have been compared and analyzed their characteristics including TFT performance, process window. etc. Results showing here indicate that a 5-mask TFT manufacturing process can be optimized with low cost, high production yield and high performance. These properties let the reduced mask TFT array process reveal a much higher potential in mass production.
Research Institute (ERSO/ITRI) Taiwan §1. AbstractThe amorphous silicon thin film transistors (TFTs) with four-photolithography process have been developed and studied. And a two-step-exposure (TSE) technology has been developed in application for process reduction. The result shows that a-Si TFT with four-photolithography process has great potential in mass production.
The two-step-exposure (TSE) technology has been developed in application for combination the active layer with metal II layer. And this TSE technology has been applied in our Reduced-Mask process (five-mask) for cost reduction. The result shows that this amorphous-silicon thin-film transistor with four-photolithography process has great potential in mass production.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.