Guided by the paper [10] by Polyakov and Rychkov, we compute the second variational derivative of a wavy plane Wilson surface observable, to find that a necessary condition for a proposed surface equation to be satisfied in the large-N limit is that we are in the critical dimension D = 6.
Monte Carlo simulation of gel formation and surface and line-edge roughness in negative tone chemically amplified resists Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation J.Resists using polyphenol resin are introduced to reduce line-edge roughness ͑LER͒, and the spatial frequency characteristics of LER are evaluated. It is found that the long-period components of LER are suppressed in our low molecular-weight polyphenol resists. Device simulation using the measured LER shows that our polyphenol-based resist can drastically reduce the number of low-threshold-voltage ͑V th ͒ transistors compared with a conventional resist due to reduced long-period LER. Because LER impact is more serious as the transistor width shrinks, our results suggest that the use of the polyphenol-type resist will be more effective in improving device performance in future lithography process. In addition, it is shown that spectral analysis is a powerful tool for LER evaluation, especially from the viewpoint of device performance estimation.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.