Pearls and shells of some mollusks are attractive inorganic materials primarily owing to the beauty of their natural lustrous and iridescent surface. The iridescent colors can be explained by diffraction or interference or both, depending on the microstructure of the surface. Strong iridescent colors are very evident on the polished shell of the mollusk Haliotis Glabra, commonly known as abalone. It would be interesting to study how these colors are produced on the surface of the shell. By using a scanning electron microscope (SEM), the surface of the shell is found to have a fine-scale diffraction grating structure, and stacks of thin crystalline nacreous layers or platelets are found below the surface. These observations suggest that the iridescent colors are caused by both diffraction and interference. From measurements done on the diffraction patterns that were obtained using a He-Ne laser illuminating the shell, the groove width of the grating structure was derived. Good agreement was found between the derived groove density by diffraction and that measured directly using the SEM. The crystalline structure of the nacreous layers of the shell is studied using Fourier transform infrared spectroscopy and SEM observations. The infrared absorption peaks of 700, 713, 862 and 1083 cm-1 confirmed that the nacre of the shell is basically aragonite. The strong iridescent colors of the shell are the result of high groove density on the surface which causes diffraction. The uniform stacking of layers of nacre below the surface of the shell also causes interference effects that contribute to the iridescent colors.

The average total neutron yield is measured, using an indium foil activation detector, at various combinations of filling gas pressures (including the higher pressure operation regime) of deuterium, capacitor bank charging voltages, anode lengths and insulator sleeve lengths to optimize the neutron yield from the NX2 Plasma Focus device. A remarkable six-fold increase in the average maximum total neutron yield, to a record value of (7 ± 1) × 10 8 neutrons per shot, compared to the similar energy UNU-ICTP Plasma Focus device is achieved for deuterium at a relatively much higher filling gas pressure of 20 mbar. The average peak neutron energy for the axial direction (0˚), radial direction (90˚) and backward direction (180˚) is estimated to be 2.89 ± 0.25 MeV, 2.49 ± 0.20 MeV and 2.11 ± 0.12 MeV, respectively. The average forward to radial neutron yield anisotropy is found to be 1.46 ± 0.28. The neutron energy and anisotropy measurements suggest that the neutron production mechanism may be predominantly beam target.

This paper presents a 4-phase radiative plasma focus model, where the dynamics of the current sheath is represented using Lee's model. The model is based on the snowplow model in the axial phase and the slug model in the radial phase, complemented with sensible estimations made for the plasma parameters. The x-ray emission characteristics are investigated using a corona plasma equilibrium model. A refinement to the code was made, firstly by taking into account the tapering of the anode in the axial phase and secondly by including the energy loss due to recombination radiation in the slow compression (radiative) phase. Our improved code was calibrated for the NX2, a 3 kJ plasma focus device, operated in neon at a pressure range of 4-7 mbar with a tapered copper anode. An additional macro was programmed to the code in order to automate the curve fitting of the simulated current traces with those obtained experimentally. The resulting theoretical x-ray yield predictions are compared against experimental data, showing good agreement in terms of pressure dependence trends. The model, however, appears to consistently underestimate the absolute x-ray yield when compared with the experimentally obtained values.

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Future applications of microelectromechanical systems (MEMS) require lithographic performance of very high aspect ratio. Chemically amplified resists (CARs) such as the negative tone commercial SU-8 provide critical advantages in sensitivity, resolution, and process efficiency in deep ultraviolet, electron-beam, and X-ray lithographies (XRLs), which result in a very high aspect ratio. In this investigation, an SU-8 resist was characterized and optimized for X-ray lithographic applications by studying the cross-linking process of the resist under different conditions of resist thickness and X-ray exposure dose. The exposure dose of soft X-ray (SXR) irradiation at the average weighted wavelength of 1.20 nm from a plasma focus device ranges from 100 to 1600 mJ/cm(2) on the resist surface. Resist thickness varies from 3.5 to 15 mum. The cross-linking process of the resist during post-exposure bake (PEB) was accurately monitored using Fourier transform infrared (FT-IR) spectroscopy. The infrared absorption peaks at 862, 914, 972, and 1128 cm(-1) in the spectrum of the SU-8 resist were found to be useful indicators for the completion of cross-linking in the resist. Results of the experiments showed that the cross-linking of SU-8 was optimized at the exposure dose of 800 mJ/cm(2) for resist thicknesses of 3.5, 9.5, and 15 microm. PEB temperature was set at 95 degrees C and time at 3 min. The resist thickness was measured using interference patterns in the FT-IR spectra of the resist. Test structures with an aspect ratio 3:1 on 10 microm thick SU-8 resist film were obtained using scanning electron microscopy (SEM).

Electron beam emission characteristics from neon, argon, hydrogen and helium in an NX2 dense plasma focus (DPF) device were investigated in order to optimize the plasma focus device for deposition of thin films using energetic electron beams. A Rogowski coil and CCD based magnetic spectrometer were used to obtain temporal characteristics, total electron charge and energy distributions of electron emission from the NX2 DPF device. It is found that hydrogen should be the first choice for thin film deposition as it produces the highest electron beam charge and higher energy (from 50 to 200 keV) electrons. Neon is the next best choice as it gives the next highest electron beam charge with mid-energy (from 30 to 70 keV) electrons. The operation of NX2 with helium at voltages above 12 kV produces a mid-energy (from 30 to 70 keV) electron beam with low-electron beam charge, however, argon is not a good electron beam source for our NX2 DPF device. Preliminary results of the first ever thin film deposition using plasma focus assisted pulsed electron deposition using a hydrogen operated NX2 plasma focus device are presented.

We report the observations of pinching in a miniature plasma focus (PF) (58-160 J) operated in repetitive mode using fast pseudospark switch (PSS). The size of the device, which includes the capacitor bank, PSS and the focus chamber, is of the order of 22 cm ×22 cm × 38 cm. Several diagnostic tools, the gated imager, streak camera, current and voltage probe, are employed simultaneously to confirm the occurrence of pinching in this fast miniature PF device. The device is optimized for operation in neon and hydrogen as the working gas. The best focus formation was obtained at pressures between 0.5 to 8.0 mbar for neon and between 7.0 to 15.0 mbar for hydrogen. When the system was operated at 100 J with hydrogen as the filling gas, the typical dip in the current derivative signal and the typical peak in the voltage signal associated with pinch compression, are observed to be most intense indicating efficient pinching in the miniature PF device.

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