Optimization of the high pressure operation regime for enhanced neutron yield in a plasma focus device

Koh, J. M.; Rawat, Rajdeep Singh; Patran, A.; Zhang, T; Wong, D.; Springham, S. V.; Tan, T.L.; Lee, S; Lee, P

doi:10.1088/0963-0252/14/1/002

Cited by 83 publications

(50 citation statements)

References 26 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Later, Koh et al [17] enhanced the neutron yield by varying the anode and insulator sleeve length combinations, deuterium gas pressures and charging voltages. A neutron yield of (7 ± 1) 9 10 8 n/shot was obtained at 20 mbar which has shifted the operation to high pressure regime rather than conventional reported pressure range of 3-6 mbar.…”

Section: Introductionmentioning

confidence: 99%

Parametric Optimisation of Plasma Focus Devices for Neutron Production

et al. 2015

View full text Add to dashboard Cite

A large number of experimental investigations have been carried out on plasma focus devices especially at low energy level of several kJ or over 100 kJ. There are few machines operating in the middle energy range of 10-50 kJ, where the neutron yield typically in the order of 10 8 -10 9 per shot. This paper reviews the optimisation process of two different plasma focus devices (12 kJ) by applying the Lee model code. The neutron yield (Y n ) versus pressure (P) curve for several configurations of the two plasma focus provided insight of geometrical optimisation. Measured discharge current is fitted as the first step of modelling to correctly simulate the plasma dynamics. Subsequently the code is used to simulate the neutron yield of the two plasma focus devices based on beam target mechanism. Good agreement between the computed results of neutron yield versus pressure and the measured yield versus pressure is found up to the pressure where highest neutron yield is obtained. Computed highest neutron yield for most of the configuration typically differ by a factor\2.

show abstract

Section: Introductionmentioning

confidence: 99%

Parametric Optimisation of Plasma Focus Devices for Neutron Production

et al. 2015

View full text Add to dashboard Cite

show abstract

“…Also a drive parameter   p I a  , where I p is the peak discharge current, a is the inner electrode radius and ρ is the ambient gas density, has been derived previously to a plasma focus devices of different types [10][11][12][13] This parameter determines the speed of the PCS in both axial and radial phases and it has a constant value for Mather type of different aspect ratios, gas pressures and discharge current [11]. Also some authors confirmed that the drive parameter has a remarkably constant value of PF devices with a range of energies from a few KJ to hundreds of KJ [14].…”

Section: Introductionmentioning

confidence: 99%

Plasma Current Sheath Motion in Coaxial Plasma Discharge

Allam¹,

El-Sayed²,

Soliman³

2011

EPE

View full text Add to dashboard Cite

In this paper experiments and theoretical treatments [1] on 1.5 KJ coaxial plasma discharge device have been carried out to show, plasma current sheath, PCS, motion in coaxial plasma discharge by studying: the effect of nitrogen gas pressure in the range from 1 to 2.2 Torr and the axial position of PCS along the coaxial electrodes on the modification factor, actual drive parameter, PCS curvature and shape (thickness). Also the dynamics of PCS along the coaxial electrodes due to the combination effect of induced azimuthal and axial magnetic fields induction has been detected experimentally by using a magnetic probe technique.

show abstract

“…The plasma focus device [12,13] is a simple pulsed plasma accelerator that uses selfgenerated magnetic field to compress the gas to a high density (10 25 -10 26 m -3 ) and high temperature (1-2 keV) plasma for a short duration. It is a rich source of emitting the high energetic ions [14], X-rays [15], relativistic electrons [16,17] and neutrons [18]. The plasma focus device has many potential applications such as a soft X-ray source [19] for the next generation of microelectronics lithography, surface micromachining, pulsed X-ray and neutron source for medical and security inspection applications and material modification [20].…”

Section: Introductionmentioning

confidence: 99%

Deposition of Chromium Thin Films on Stainless Steel-304 Substrates Using a Low Energy Plasma Focus Device

et al. 2011

View full text Add to dashboard Cite

In this paper, we study thin films of chromium deposited on stainless steel-304 substrates using a low energy (1.6 kJ) plasma focus device. The films of chromium are likewise deposited with 25 focus shots each at various axial distances from the top of the anode (3, 5, 7, 9 and 11 cm). We also consider different angular positions with respect to the anode axis (0°, 15°and 30°) at a distance of 5 cm from the anode tip to deposit the chromium films on the stainless steel substrates. To characterize the structural properties of the films, we benefit from X-ray diffraction (XRD) analysis. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) are applied as well to study the surface morphology of these deposited films. Furthermore, we make use of Vicker's micro-hardness measurements to investigate the mechanical properties of chromium thin films. The XRD results show that the degree of crystallinity of chromium thin films depends on the substrate axial and angular positions. The AFM images illustrate that the film deposited at the distance of 5 cm and the angular position of 0°has quite a uniform surface with homogeneous distribution of grains on the film surface. From the hardness results, we observe that the sample deposited at the axial distance of 5 cm from the anode tip and at the angle of 0°with respect to the anode axis, is harder than the other deposited films.

show abstract

Optimization of the high pressure operation regime for enhanced neutron yield in a plasma focus device

Cited by 83 publications

References 26 publications

Parametric Optimisation of Plasma Focus Devices for Neutron Production

Parametric Optimisation of Plasma Focus Devices for Neutron Production

Plasma Current Sheath Motion in Coaxial Plasma Discharge

Deposition of Chromium Thin Films on Stainless Steel-304 Substrates Using a Low Energy Plasma Focus Device

Contact Info

Product

Resources

About