The methodology, implementation and results of a design for manufacturing (DFM) technique as applied to an integrated circuit boron base formation for an NPN transistor are presented. The primary purpose of the DFM technique is to achieve acceptable statistical prediction of the results by using the minimum number of variables and reducing the time required to perform physically-based simulations. Excellent statistical results are achieved while the number of simulations is reduced by at least a factor of five if judicious statistical techniques are applied.

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Generic STADIUM is a software shell which can provide design of experiment (DOE) capabilities to almost any simulator. This paper discusses enhancements to the first version of Generic STADIUM to add a more intuitive and interactive user interface, to increase design of experiment capabilities and to automate optimization techniques. Representations of the graphical user interface and information about the automated optimization capabilities are presented. Introduction:

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An important concem whether designing a new process or maintaining an existing one is the cost of production and hence the chip yield. In order to maximize chip yield, the most significant process parameters need to be identified so that variations in these critical parameters can be minimized resulting in the hghest possible chlp veld. Presented in h s paper is a software-based methodology for facilitatmg the identification of critical process parameters and relating them to circuit level performances using statistical analysis techmques and conventional simulators.