PACS 61.82.Ms, The paper is concerned with fast and ultra-fast processes in insulating materials under the irradiation by a high-current-density electron beam of a nanosecond pulse duration. The inflation process induced by the interaction of a high-intensity electron beam with a dielectric is examined. The "instantaneous" distribution of non-ionizing electrons and holes is one of the most important stages of the process. Ionizationpassive electrons and holes make the main contribution to many fast processes with a characteristic time in the range 10 -14 ÷ 10 -12 s: high-energy conductivity, intraband luminescence, etc. A technique was developed for calculation of the "instantaneous" distribution of non-ionizing electrons and holes in a dielectric prior to electron-phonon relaxation. The following experimental effects are considered: intraband luminescence, coexistence of intraband electron luminescence and band-to-band hole luminescence in CsI, high energy conductivity; generation of mechanical fields and their interaction with cracks and dislocations.
Since 1975 our lab has been investigating the critical electron emission from dielectrics into vacuum with nanosecond time resolution using highcurrent-density electron accelerators. It allowed us to clear up some intrinsic properties of the critical electron emission induced by electron beam injection: (1) The emission pulse is delayed for several nanoseconds from the injection one. (2) The peak value of the emission current reaches 100 -1000 A. (3) The direct experimental evidence is obtained for intense electron-hole generation by superhigh electric field in subsurface layer of dielectric. And this process is discovered to be the main reason of the transition to critical electron emission. (4) Critical emission is not uniform and accompanied by point explosions on the dielectric surface and by injections of ion plasmas from these points into vacuum. (5) Transition of critical emission to vacuum breakdown has been observed.
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