Articles you may be interested inInhibiting spontaneous etching of nanoscale electron beam induced etching features: Solutions for nanoscale repair of extreme ultraviolet lithography masks The use of low-energy ͑Ϸ15 keV͒ electron beams for pumping laser systems in dense gases with high specific power deposition is described. Thin ͑300 nm͒ SiN x ceramic foils used as entrance window in a transverse geometry for the electron beam allows pressure differentials of several atmospheres with low percentage energy loss in transmission. The 1.73 m XeI (5d͓3/2͔ 1 -6p͓5/2͔ 2 ) infrared laser was used for a first demonstration of this concept. The laser operated between 130 and 650 mbar. A threshold pumping power of 5.3 W and a maximum output power of 6 mW were observed. The system can be scaled to high pumping power ͑ϷMW/cm 3 ͒ and short wavelength.
Low energy electron beams with particle energies of typically I 0 to 20 keV are used for puming gas lasers. Extremely thin (300 nm) ceramic (SiNk) membranes are used as entrance foils for the electron beam. Laser gas pressure up to several atmospheres is possible using this technique if the dimension of one side of the foil is restricted to about 1 mm. Energy loss of the electrons in the foil is less than 1 0%. The short range of the low energy electrons in the laser medium leads to a high specific power deposition. In transverse geometry the beam pumped volume is cylindrical with typically I to 3 mm diameter. This is well matched with the diameter of optical modes in stable optical cavities. The new pumping method is demonstrated using the 1 .73 jim 5d[312J -6p[5/212 XeI laser line in Ar-Xe laser gas mixtures at pressures between I 30 and 650mbar. Laser effect was observed for Xe concentrations between 0.1 and I %. A low threshold pumping power of 5.5W and a maximum output power of 6 mW at I 3 W pumping power were measured. Scaling to higher power and shorter wavelength laser systems is discussed.
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