Wound infection and poor wound healing are the major challenges of wound treatment. Antibiotic drug treatment is the effective way to inhibit wound infection. It is necessary to achieve sustained release of antibiotics to get a longer treatment for wound infection. The double network hydrogels based on liposome, polyethylene glycol (PEG), α- cyclodextrin ( α-CD) and acrylamide (AM) were developed, in which liposome acts as amoxicillin repository. Because the drug would release from the multiple barriers including two cavities of liposome and α-CD, as well as polyethylene glycol - α- cyclodextrin/acrylamide (PEG-CD/AM) double network, the PEG- α-CD/AM/liposome @amoxicillin double network hydrogels could achieve sustained drug release. The drug release assay showed that the dressing could release amoxicillin continuously until 12 days, than that of 8th day for single-network hydrogel releasing. The antibacterial ratio of the hydrogel could reach above 80%. What’s more, the hydrogels present adjustable mechanical strength by changing the ratio of the components. The swelling ratio proved that the hydrogel had potential ability to absorb wound exudates. The cytotoxicity test of the hydrogels demonstrated excellent biocompatibility. These results indicated that this study can provide a new thought for antibacterial wound dressing and has a broad application prospect.
Multiple patterning is the defacto manufacturing technology for today's advanced semiconductor devices. However, this technology is becoming limited by technical challenges including cost, resolution, overlay and defectivity. To address these challenges there is growing interest in post lithographic processes which can reduce the pattern feature size thereby effectively enabling increased resolution corresponding to low k1 imaging which is not available by single exposure schemes. In addition to increased resolution, these processes can also improve Process Window (PW), Line Width Roughness (LWR) and Critical Dimension Uniformity (CDU).In this paper, we describe our technical approaches to reducing the Critical Dimension (CD) of resist patterns especially on the most challenging layers. In the area of Bright Field (BF) imaging, we have successfully developed a Positive Tone Develop Trim (PTDT) material which effectively reduces the CD of 193nm immersion line/space (L/S) features generated by a conventional PTD process. To enable CD shrink of Dark Field (DF) features [trenches and contact holes (C/H)] as generated by a 193nm immersion Negative Tone Develop (NTD) process, we have developed a NTD Shrink (NTDS) material. Both PTDT and NTDS approaches are low cost spin on track based processes and are competitive with other approaches in terms of cost, controlled shrink amount, post shrink PW and pattern fidelity.
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