The voltage current property of the unbalanced magnetron sputtering (UMS) system has significant influence on the sputtering process and films deposition process. Based on the analysis of the relationship between unbalanced magnetic field and properties of the unbalanced magnetron sputtering system, according to Child law the model of the V-I property of the UMS system is set up. Comparisons between the model calculation results and the experimental data indicate that the model correctly expresses the relation between the unbalanced magnetic field and the discharge properties of the UMS system.
A conventional magnetron and a coaxial electrosolenoid were used to construct an unbalanced magnetron sputtering deposition system for investigating its properties. At 02Pa, argon gas discharging, a shielded planar ioncollecting electrode was taken to measure the saturation ion beam flux density at the different axial positions. The saturation ion flux reached about 9mA/cm2. The magnetohydrodynamics was applied to analyse the influences of the magnetic mirror effect on the discharge properties caused by the solenoid. As a result, the comparisons of the theoretical calculations with the experiments indicated that the model described correctly the plasma properties in the unbalanced magnetron sputtering system.
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