Investigation of the model of the discharge properties of the unbalanced magnetron sputtering system

In the four-anode device, the mirror magnetic field affects the characteristics of charged particles motion, so that the current-voltage relations of glow discharge are changed. Firstly, the discharge device is introduced, and the distribution of mirror magnetic field generated by the loops surrounding the discharge chamber is presented. Both the discharge currentvoltage characteristics and the radial distributions of electron density are measured, respectively, with/without the magnetic field. When the discharge occurs in a 99.99% helium with a pressure ranging from 100 Pa to 800 Pa without magnetic field, the voltage, sustaining a certain abnormal glow discharge current, decreases with the increase in gas pressure. With a mirror magnetic field of certain intensity, the discharge voltage increases with the current in a rate slower than that without the magnetic field. Moreover, when the magnetic field intensity increases, the discharge voltage first decreases then increases. Simultaneously, the mirror magnetic field affects the moving characteristics of charged particles, and causes a more inhomogeneous electron density.

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Modeling and plasma characteristics of high-power direct current discharge

Chen

Cui

Tang

et al. 2020

Plasma Sources Sci. Technol.

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To obtain both high ionization and high deposition rate, a modified global model for a continuous high-power DC magnetron sputtering (C-HPMS) is established by considering the continuous generation of the hot electrons and the high temperature caused by continuous high-power discharge. The results show that the plasma density is on the order of 1019 m−3 for power densities of only 183 W cm−2 (Al) and 117 W cm−2 (Cu). The ionization rate exceeds 90% of high-power impulse magnetron sputtering (HiPIMS) (peak power density of 564 W cm−2) for a DC power density of 180 W cm−2, and the total diffusion fluxes of the two targets are 26 (Al) and 30 (Cu) times that of conventional HiPIMS, leading to very high deposition rates. The work provides a theoretical basis for the realization of C-HPMS and gives an enlightenment to the development of deposition equipment for continuous high-power discharges.

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Investigation of the model of the discharge properties of the unbalanced magnetron sputtering system

Cited by 6 publications

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Synergistic enhancement effect between external electric and magnetic fields during high power impulse magnetron sputtering discharge

Synergistic enhancement effect between external electric and magnetic fields during high power impulse magnetron sputtering discharge

Effect of Mirror Magnetic Field on Abnormal Glow Discharge of Four-Anode Device

Modeling and plasma characteristics of high-power direct current discharge

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