Lasers are recognized for coherent light emission, the onset of which is reflected in a change in the photon statistics. For many years, attempts have been made to directly measure correlations in the individual photon emission events of semiconductor lasers. Previously, the temporal decay of these correlations below or at the lasing threshold was considerably faster than could be measured with the time resolution provided by the Hanbury Brown/Twiss measurement set-up used. Here we demonstrate a measurement technique using a streak camera that overcomes this limitation and provides a record of the arrival times of individual photons. This allows us to investigate the dynamical evolution of correlations between the individual photon emission events. We apply our studies to micropillar lasers with semiconductor quantum dots as the active material, operating in the regime of cavity quantum electrodynamics. For laser resonators with a low cavity quality factor, Q, a smooth transition from photon bunching to uncorrelated emission with increasing pumping is observed; for high-Q resonators, we see a non-monotonic dependence around the threshold where quantum light emission can occur. We identify regimes of dynamical anti-bunching of photons in agreement with the predictions of a microscopic theory that includes semiconductor-specific effects.

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We report on the fabrication of pseudomorphic wurtzite Ga1−xMnxN grown on GaN with Mn concentrations up to 10% using molecular beam epitaxy. According to Rutherford backscattering, the Mn ions are mainly at the Ga-substitutional positions, and they are homogeneously distributed according to depth-resolved Auger-electron spectroscopy and secondary-ion mass-spectroscopy measurements. A random Mn distribution is indicated by transmission electron microscopy, and no Mn-rich clusters are present for optimized growth conditions. A linear increase of the c-lattice parameter with increasing Mn concentration is found using x-ray diffraction. The ferromagnetic behavior is confirmed by superconducting quantum-interference measurements showing saturation magnetizations of up to 150 emu/cm3.

Al 1 − x In x N layers with an indium content between x=10.5% and x=24% were grown by metal-organic vapor-phase epitaxy and characterized concerning their optical, structural and morphological properties with regard to the realization of optoelectronic devices. The indium content and the strain of these layers were measured by high resolution x-ray diffraction. Ellipsometric measurements were used to determine the optical constants [refractive index n(λ) and extinction coefficient κ(λ)] in dependence of wavelength and indium content. The values determined for the electronic bandgaps are in good agreement with theoretical predictions and previous publications on this topic but are more focused on AlInN layers which are pseudomorphically grown on GaN. A bowing parameter of b=10.3±0.1 was determined for fully strained layers with an indium content between 13% and 24%. In order to investigate the suitability of these layers for use in distributed Bragg reflectors, the surface morphology is characterized with respect to the indium content. Furthermore, the influence of an annealing step which often is necessary during device growth, was studied. The influence of this annealing step on the roughness was analyzed by atomic force microscopy, while structural features are monitored by high resolution secondary electron microscopy images. Based on these results distributed Bragg reflectors for the green spectral region with up to 40 pairs and a peak reflectivity of 97% have been realized. Transmission electron microscopic analysis of the layer interfaces are in good agreement with the atomic force and secondary electron microscopy images of the single layer surfaces.

Monolithic II-VI pillar microcavities made of ZnSSe and MgS∕ZnCdSe supperlattices have been fabricated by molecular-beam epitaxy and focused-ion-beam etching. Discrete optical modes of the pillar microcavities are studied in photoluminescence measurements. The optical modes are identified by means of calculations based on an extended transfer matrix method. Achievable Purcell factors well above 10 can be estimated from the measured quality factors and calculated mode volumes.