Three different discharge chemistries for dry etching of gratings in InP laser structures have been investigated. Each type of plasma (HI/HZ, CH4/H2, GHB/H2) yields controllable Btch rates that are constant with etching time. Lower DC self-biases can be used with HI/Hz because of the greater volatility of the group 111 etch products. The &H& mixture produces excessive polymer deposiiion un iiie priuroresisi rriasK ar pru~ess piessures 3 iir riiiori. The rectangular shape d the gratings is preserved during wergrowth by organo-metallic vapour phase epitaxy.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.