The cleaning action in AC TIG welding is attributed to the oxide film removal process caused by cathode spots. Clarifying the behavior mechanism of these cathode spots will enable the control of the cleaning action. However, the behavior mechanism of cathode spots has not yet been experimentally clarified. This study reports that observations by high-speed video camera revealed the absence of cathode spots at the center of the molten pool, when shot in the vicinity of a molten pool after AC TIG welding using helium as shield gas on aluminum plates.
Abstract:The low-pressure high-frequency plasma chemical vapor deposition (CVD) system was developed with nonthermal plasma process to study the Polyethylene naphthalate (PEN) surface characteristics. Plasma surface treatment by oxygen can improve the adhesive properties. A mixture of Ar and O 2 gas was used in the plasma treatment. The oxygen gas flow rate was between 0.1 L/min and 0.5 L/min, whereas the Ar gas flow rate was set at 10 L/min. The surface was investigated by contact angle meter and X-ray photoelectron spectroscopy (XPS) to determine the differences between untreated and treated surfaces. The results indicated that the low-pressure high-frequency plasma chemical vapor deposition system could be used for surface modification.
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