This paper presents the first parameterized, SPICEcompatible compact model of a Graphene Nano-Ribbon FieldEffect Transistor (GNRFET) with doped reservoirs, also known as MOS-type GNRFET. The current and charge models closely match numerical TCAD simulations. In addition, process variation in transistor dimension, line edge roughness, and doping level in the reservoirs are accurately modeled. Our model provides a means to analyze delay and power of graphene-based circuits under process variation, and offers design and fabrication insights for graphene circuits in the future. We show that line edge roughness severely degrades the advantages of GNRFET circuits; however, GNRFET is still a good candidate for lowpower applications.

This paper presents an accurate analytical compact model for Schottky-barrier-type graphene nanoribbon field-effect transistors (SB-GNRFETs). This is a physics-based analytical model for the current-voltage (I-V ) characteristics of SB-GNRFETs. The proposed model considers various design parameters and process variation effects, including graphenespecific line-edge roughness, which allows thorough exploration and evaluation of SB-GNRFET circuits. We develop accurate approximations of SB tunneling, channel charge, and current, which provide accurate results while maintaining model compactness. We evaluate the effect of design parameters and process variations on the performance of SB-GNRFETs. We also compare circuit-level performance of SB-GNRFETs with multigate (MG) Si-CMOS (e.g., FinFETs). Our circuit simulations indicate that SB-GNRFET has an energy-delay product (EDP) advantage over Si-CMOS, although GNR-specific process variation, especially the line-edge roughness, would significantly downgrade such an advantage; the EDP of the ideal SB-GNRFET (assuming no process variation) is ∼2.5% of that of Si-CMOS, while the EDP of the nonideal case with process variation is ∼68% of that of Si-CMOS. Finally, we study technology scaling with SB-GNRFET and MG Si-CMOS. We show that the EDP of ideal (nonideal) SB-GNRFET is ∼0.88% (54%) EDP of that of Si-CMOS as the technology nodes scale down to 7 nm.Index Terms-Graphene nanoribbon field-effect transistor (GNRFET), nanoelectronics, Schottky barrier (SB), SPICE model.

No abstract

No abstract

No abstract