The properties of n‐GaP/p‐Si interface as well as their influence on solar cell performance are studied for GaP layers grown by low‐temperature (380 °C) plasma‐enhanced atomic layer deposition (PE‐ALD). The influence of different plasma treatments and RF power values are explored. The increase of RF power leads to a growth transition from amorphous (a‐GaP) to microcrystalline GaP (μc‐GaP) with either amorphous‐GaP/Si or epitaxial‐GaP/Si interface, respectively. However, when continuous hydrogen plasma is used the amorphous‐GaP/Si interface exhibits better photovoltaic performance compared to the epitaxial one. Values of open circuit voltage, Voc = 0.45–0.55 V and internal quantum efficiencies, IQE > 0.9 are obtained for amorphous‐GaP/Si interfaces compared to Voc = 0.25–0.35 V and IQE < 0.45 for epitaxial‐GaP/Si interfaces. According to admittance spectroscopy and TEM studies the near‐surface (30–50 nm) area of the Si substrate is damaged during growth with high RF power of hydrogen plasma. A hole trap at the level of EV + (0.33 ± 0.02) eV is detected by admittance spectroscopy in this damaged Si area. The damage of Si is not observed by TEM when the deposition of the structures with epitaxial‐GaP/Si interface is realized by a modified process without hydrogen plasma indicating that the damage of the near‐surface area of Si is related to hydrogen plasma interaction.

Amorphous chalcogenides usually exhibit a resistivity, which increases with age following a power law ρ ∼ tα. Existing theories link this change in amorphous state resistivity to structural relaxation. Here, the impact of fundamental glass properties on resistance drift phenomena in amorphous GexTe1−x networks is studied. Employing Raman spectroscopy, the Maxwell rigidity transition from flexible to stressed rigid is determined to occur in the compositional range 0.250 &lt; xc &lt; 0.265. Stressed rigid glasses (x &gt; 0.265) exhibit rather strong resistance drift, where the drift parameters increase steadily from α = 0.13 for amorphous GeTe to α = 0.29 for compositions near the stiffness threshold xc. On the other hand, the drift parameter in flexible glasses (x &lt; 0.25) decreases with decreasing Ge content x to values as low as α = 0.05. These findings illustrate the strong impact of the stiffness threshold on resistance drift phenomena in chalcogenides.

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International audienceThe epitaxial lateral overgrowth of microscale GaAs crystals on a 0.6 nm thick SiO2 layer from nanoscale Si seeds is investigated in order to develop GaAs monolithic hetero-epitaxy onto (001) Si. The nucleation from small width openings enables to avoid the emission of misfit dislocations and the formation of antiphase domains. Consequently, the interface between the GaAs island and the SiO2 layer remains perfectly sharp and free of defects. The only defects found by transmission electron microscopy in each island are pairs of twins, and a simple model based on the anisotropy of zinc blende crystal is proposed to explain their formation. Micro-photoluminescence measurements performed at room temperature show that these twins are not detrimental for the quality of microscale GaAs crystals

Confocal micro-photoluminescence (PL) spectroscopy has become a powerful characterization technique for studying novel photovoltaic (PV) materials and structures at the micrometer level. In this work, we present a comprehensive study about the effects and implications of photon reabsorption phenomena on confocal micro-PL measurements in crystalline silicon (c-Si), the workhorse material of the PV industry. First, supported by theoretical calculations, we show that the level of reabsorption is intrinsically linked to the selected experimental parameters, i.e., focusing lens, pinhole aperture, and excitation wavelength, as they define the spatial extension of the confocal detection volume, and therefore, the effective photon traveling distance before collection. Second, we also show that certain sample properties such as the reflectance and/or the surface recombination velocity can also have a relevant impact on reabsorption. Due to the direct relationship between the reabsorption level and the spectral line shape of the resulting PL emission signal, reabsorption phenomena play a paramount role in certain types of micro-PL measurements. This is demonstrated by means of two practical and current examples studied using confocal PL, namely, the estimation of doping densities in c-Si and the study of back-surface and/or back-contacted Si devices such as interdigitated back contact solar cells, where reabsorption processes should be taken into account for the proper interpretation and quantification of the obtained PL data. Published by AIP Publishing.

Suspended graphene membrane presents a particular structure with fundamental interests and applications in nanomechanics, thermal transport and optoelectronics. Till now, the commonly used geometries are still quite simple and limited to the microscale. We propose here to overcome this problem by making nanostructures in suspended epitaxial bilayer graphene on a large scale and with a large variety of geometries. We also demonstrate a new hybrid thin film of SiC-graphene with an impressive robustness. Since the mechanics and thermal dissipation of a suspended graphene membrane are strongly related to its own geometry, we have in addition focused on thermal transport and strain engineering experiments. Micro-Raman spectroscopy mapping was successfully performed for various geometries with intrinsic properties measurements at the nanoscale. Our engineering of graphene geometry has permitted to reduce the thermal transport, release and modulate the strain in our structures.

We develop a contactless method based on photoluminescence measurements in the modulated mode: the high-frequency modulated photoluminescence. The high frequency domain allows accessing to carrier dynamics in the nanosecond time scale which is typical for thin films materials. To illustrate the experimental method, we analyze Cu(In,Ga)Se 2 photovoltaic absorbers where recombination mechanisms in the bulk, surface and grain boundaries are not completely understood. We correlate the data with classical time resolved photoluminescence. We show that the combination of the two methods allows, with the help of one dimensional simulations, an estimation of carrier traps and recombination centers parameters in thin films samples.

In this article, we have demonstrated a solid carbon source such as camphor as a natural precursor to synthesize a large area mono/bi-layer graphene (MLG) sheet to fabricate a nanowire junction-based near infrared photodetectors (NIRPDs). In order to increase the surface-to-volume ratio, we have developed Si-nanowire arrays (SiNWAs) of varying lengths by etching planar Si. Then, the camphor-based MLG/Si and MLG/SiNWAs Schottky junction photodetectors have been fabricated to achieve an efficient response with self-driven properties in the near infrared (NIR) regime. Due to a balance between light absorption capability and surface recombination centers, devices having SiNWAs obtained by etching for 30 min shows a better photoresponse, sensitivity and detectivity. Fabricated NIRPDs can also be functioned as self-driven devices which are highly responsive and very stable at low optical power signals up to 2 V with a fast rise and decay time of 34/13 ms. A tremendous enhancement has been witnessed from 36 μA W−1 to 22 mA W−1 in the responsivity at 0 V for MLG/30 min SiNWAs than planar MLG/Si PDs indicating an important development of self-driven NIRPDs based on camphor-based MLG for future optoelectronic devices.