Resistance switching memory operating by a purely electronic switching mechanism, which was first realized in Pt-dispersed SiO2 thin films, satisfies criteria including high uniformity, fast switching speed, and long retention for non-volatile memory application. This resistive element obeys Ohm's law for the area dependence, but its resistance exponentially increases with the film thickness, which provides new freedom to tailor the device characteristics.

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Insulators and conductors with periodic structures can be readily distinguished, because they have different band structures, but the differences between insulators and conductors with random structures are more subtle. In 1958, Anderson provided a straightforward criterion for distinguishing between random insulators and conductors, based on the 'diffusion' distance ζ for electrons at 0 K (ref. 3). Insulators have a finite ζ, but conductors have an infinite ζ. Aided by a scaling argument, this concept can explain many phenomena in disordered electronic systems, such as the fact that the electrical resistivity of 'dirty' metals always increases as the temperature approaches 0 K (refs 4-6). Further verification for this model has come from experiments that measure how the properties of macroscopic samples vary with changes in temperature, pressure, impurity concentration and applied magnetic field, but, surprisingly, there have been no attempts to engineer a metal-insulator transition by making the sample size less than or more than ζ. Here, we report such an engineered transition using six different thin-film systems: two are glasses that contain dispersed platinum atoms, and four are single crystals of perovskite that contain minor conducting components. With a sample size comparable to ζ, transitions can be triggered by using an electric field or ultraviolet radiation to tune ζ through the injection and extraction of electrons. It would seem possible to take advantage of this nanometallicity in applications.

Nanoelectronic memory based on trapped charge need to be small and fast, but fundamentally it faces a voltage-time dilemma because the requirement of a high-energy barrier for data retention under zero/low electrical stimuli is incompatible with the demand of a low-energy barrier for fast switching under a modest programming voltage. One solution is to embed an atomic-level lever of localized electron-phonon interaction to autonomously reconfigure trap-site's barrier in accordance to the electron-occupancy of the site. Here we demonstrate an atomically levered resistance-switching memory built on locally flexible amorphous nanometallic thin films: charge detrapping can be triggered by a mechanical force, the fastest one being a plasmonic Lorentz force induced by a nearby electron or positron bunch passing in 10(-13) s. The observation provided the first real-time evidence of an electron-phonon interaction in action, which enables nanometallic memory to turn on at a subpicosecond speed yet retain long-term memory, thus suitable for universal memory and other nanoelectron applications.

Dielectric thin films in nanodevices may absorb moisture, leading to physical changes and property/performance degradation, such as altered data storage and readout in resistance random access memory. Here we demonstrate using a nanometallic memory that such degradation proceeds via nanoporosity, which facilitates water wetting in otherwise nonwetting dielectrics. Electric degradation only occurs when the device is in the charge-storage state, which provides a nanoscale dielectrophoretic force directing H2O to internal field centers (sites of trapped charge) to enable bond rupture and charged hydroxyl formation. While these processes are dramatically enhanced by an external DC or AC field and electron-donating electrodes, they can be completely prevented by eliminating nanoporosity, depositing a barrier layer, or using an oxidation-resistant electrode. These findings provide insight for understanding high-performance memory and field-assisted degradation of nanodevices.