2011
DOI: 10.1002/adma.201102132
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Purely Electronic Switching with High Uniformity, Resistance Tunability, and Good Retention in Pt‐Dispersed SiO2 Thin Films for ReRAM

Abstract: Resistance switching memory operating by a purely electronic switching mechanism, which was first realized in Pt-dispersed SiO2 thin films, satisfies criteria including high uniformity, fast switching speed, and long retention for non-volatile memory application. This resistive element obeys Ohm's law for the area dependence, but its resistance exponentially increases with the film thickness, which provides new freedom to tailor the device characteristics.

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Cited by 98 publications
(53 citation statements)
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“…(ζ HR essentially defines the spatial extent of electron's wave-function, which decays exponentially in a random material.) Meanwhile, V c * is thickness independent in the nanometallic regime 824. These unique attributes allow additional freedom to increase R c and decrease P by many orders of magnitude by using thicker films to take advantage of their higher HRS (see Figure 6a).…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…(ζ HR essentially defines the spatial extent of electron's wave-function, which decays exponentially in a random material.) Meanwhile, V c * is thickness independent in the nanometallic regime 824. These unique attributes allow additional freedom to increase R c and decrease P by many orders of magnitude by using thicker films to take advantage of their higher HRS (see Figure 6a).…”
Section: Resultsmentioning
confidence: 99%
“…Off-switching power should be proportional to the area of the resistance cell if the voltage/current density required to trigger switching is independent of the area. Indeed, literature data of off-switching power of some 20 RRAMs shown in Figure 1 support such a “scaling law”: they vary from the mW range for micrometer-sized devices to the μW range for nanometer-sized devices2345678910111213141516171819202122. Recognizing such a trend, our goal here is to systematically seek scalable strategies to further lower the power for RRAM off-switching.…”
mentioning
confidence: 90%
“…The adopted Verilog-A Memristor model is based on the device parameters from [26], which have been scaled to 65 nm technology according to the resistance and area relation in [37]. The memristor material is W/SiGe/a-Si/Ag and the read current applied on the memristor is 2 A.…”
Section: A Circuit Level Implementation and Simulationmentioning
confidence: 99%
“…6(a)). The Ohmic behavior for ON state was observed before for a Pt dispersed SiO x device, 33 and the Ohmic ON state was explained by metal-insulator transition of random material. But it was a bipolar resistive device.…”
mentioning
confidence: 96%