It is shown that, in the principal angle method for determining the optical constants of copper, an inflection point occurs in the relation between the angle of incidence, , and the orientation of the major axis of the elliptical state reflected from the metallic surface. This inflection point defines the principal angle of incidence, . In our treatment, the optical system for determining excludes the presence of a quarterwave plate. This has the advantage of avoiding errors in the value of arising from the possible deviation of the plate retardance from at the working wavelength. The principal azimuthal angle is then determined and the optical constants of a copper film at are presented. The effect of using an inexact quarterwave plate on the optical constants is discussed.
A parabolic mirror is used for the first time in a wide-angle ellipsometric system to determine the parameters ψ and Δ and the thickness of SiO 2 layer naturally grown on Si crystal substrate. Collimated illuminating beam of diameter 20 mm incident on a parabolic mirror is reflected at the Si-SiO 2 system to provide wide angle of incidence. The polarization states of points in the illuminated area are determined and the data is analyzed for real-time thickness maps over the measured area of the surface. The thickness of SiO 2 layer is found as 3.02 nm with Standard deviation ±0.12 nm. Null ellipsometer is also used at different angles of incidence to check our result and nearly the same thickness value was obtained.
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