Novel wide-angle ellipsometric arrangement for thin film thickness measurement

Abstract

A parabolic mirror is used for the first time in a wide-angle ellipsometric system to determine the parameters ψ and Δ and the thickness of SiO 2 layer naturally grown on Si crystal substrate. Collimated illuminating beam of diameter 20 mm incident on a parabolic mirror is reflected at the Si-SiO 2 system to provide wide angle of incidence. The polarization states of points in the illuminated area are determined and the data is analyzed for real-time thickness maps over the measured area of the surface. The thickness of SiO 2 layer is found as 3.02 nm with Standard deviation ±0.12 nm. Null ellipsometer is also used at different angles of incidence to check our result and nearly the same thickness value was obtained.

Evaluation of new designed reference blocks for calibration and NDT by optical and ultrasonic techniques

“…The displacement between the positions of the surface and the bottom of the holes is used to determine the depth. The optical constants of the Steel and Aluminum reference blocks were determined using a PHE-103Ellipsometer [12].…”

A modified method for calibration of polarimetric components using polarizing interferometry

“…There are several known methods to calibrate and measure the phase shift, resulting from transmission and reflection from the surface of the polarization materials, such as ellipsometry, Senarmont compensator technique, interference microscope, interferometry, polarization interferometry, etc [1][2][3][4][5]. The ellipsometric methods are used to measure the change in the phase and amplitude which is produced from the reflected light from the surface under test [6,7]. Senarmont compensating method is considered as a tradition technique used for the calibration of phase retardation of the polarimetric components.…”