The morphology and microstructure of RF diode sputter deposited materials is a complicated function of many parameters of the reactor operating conditions. Using a combination of computational fluid dynamics (CFD), RF plasma, molecular dynamics (MD) sputter, and direct simulation Monte Carlo (DSMC) transport models, a multiscale approach has been used to analyze the RF diode sputtering of copper. The CFD model predicts the velocity and pressure distribution of the working gas flows in the deposition chamber. The plasma model uses these CFD results to compute ion energies and fluxes at the target and substrate. The MD model of sputtering is used to determine the initial energy distribution of sputtered atoms and reflected neutral working gas atoms and both of their angular distributions. A DSMC transport model then deduces the target atom deposition efficiency, the spatial distribution of the film thickness, the target and reflected neutral atoms energy and impact angle distributions given reactor operating input conditions such as background pressure, temperature, gas type, together with the reactor geometry. These results can then be used in atomistic growth models to begin a systematic evaluation of surface morphology, nanoscale structure, and defects dependences upon the reactor design and its operating conditions.
Unique structure and ability to control the surface termination groups of MXenes make these materials extremely promising for solid lubrication applications. Due to the challenging delamination process, the tribological properties of twodimensional MXenes particles have been mostly investigated as additive components in the solvents working in the macrosystem, while the understanding of the nanotribological properties of mono-and few-layer MXenes is still limited. Here, we investigate the nanotribological properties of mono-and double-layer Ti 3 C 2 T x MXenes deposited by the Langmuir−Schaefer technique on SiO 2 /Si substrates. The friction of all of the samples demonstrated superior lubrication properties with respect to SiO 2 substrate, while the friction force of the monolayers was found to be slightly higher compared to double-and three-layer flakes, which demonstrated similar friction. The coefficient of friction was estimated to be 0.087 ± 0.002 and 0.082 ± 0.003 for mono-and double-layer flakes, respectively. The viscous regime was suggested as the dominant friction mechanism at high scanning velocities, while the meniscus forces affected by contamination of the MXenes surface were proposed to control the friction at low sliding velocities.
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