During 1991 the Oxford Instruments’ compact synchrotron x-ray source Helios was installed at IBM’s Advanced Lithography Facility, following factory tests in Oxford during 1990. The machine has met or exceeded all performance specifications at the East Fishkill site. Since January, 1992 it has been run routinely for lithography development work. Running and reliability statistics are being generated, and the results for the first five months are presented here.
Helios is a compact superconducting Synchrotron X-ray source designed specifically for lithography. It will produce a total X-ray power of 8.2 kW when the design stored beam of 200 mA is achieved. The first phase of commissioning has just been completed in less than 2 months. A stored beam of 305 mA has been accumulated at the injection energy of 200 MeV and 55 mA has been accelerated to the full energy of 700 MeV.
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