The Helios 1 compact superconducting storage ring X-ray source

Wilson, M.N.; Smith, A. I. C.; Kempson, V. C.; Townsend, M. C.; Schouten, J.C.; Anderson, R.J.; Jorden, A. R.; Suller, V.P.; Poole, M. W.

doi:10.1147/rd.373.0351

Cited by 25 publications

(3 citation statements)

References 9 publications

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“…34 It has been well demonstrated that x-ray lithography has the resolution to achieve advanced ULSI products, as well as significant advantages in process latitude, robustness, and simplicity. For such ultralarge-scale integration ͑ULSI͒ the constellation of considerations and constraints becomes far more complex than in research.…”

Section: Ulsi Using X-ray Lithographymentioning

confidence: 99%

100 years of x rays: Impact on micro- and nanofabrication

Smith

1995

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Hard x-ray phase zone plate fabricated by lithographic techniquesIn November of 1895 Wilhelm C. Röntgen observed fluorescence caused by invisible rays emanating from a discharge tube. This discovery of x rays was not a mere happenstance; Röntgen was a highly skilled experimentalist, well prepared to launch a series of clever experiments and startle the world with the announcement of ''a new kind of ray.'' The practice of medicine was transformed, and the era of modern physics inaugurated. X rays have proven essential to the probing of atomic, molecular, and solid-state structures. X-ray astronomy has revealed some of the most exotic and violent phenomena in the universe, including the black holes. X-ray microscopy provides information complementary to what is obtainable from optical and electron microscopies. In microand nanolithography x rays provide high quality aerial images and simple processing, in part because of an absence of spurious scattering, something that Röntgen himself observed. However, application in ultralarge scale integrated ͑ULSI͒ manufacturing is still uncertain for a variety of reasons, primarily because ultraviolet optical-projection lithography continues to satisfy commercial needs. X-ray lithography may find application in areas outside the ULSI industry, for example in optoelectronics, flat-panel displays, and magnetic data storage. It has the intrinsic resolution to reach the practical limits of the lithographic process, around 20 nm. However, to approach this limit diffraction blurring must be avoided by reducing the mask-sample gap below 5 m, which may not be acceptable in manufacturing. In this event, and in order to retain the lithographic qualities of 1 nm wavelength radiation, projection with Fresnel zone plate arrays could be employed.

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Section: Ulsi Using X-ray Lithographymentioning

confidence: 99%

100 years of x rays: Impact on micro- and nanofabrication

Smith

1995

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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“…ALVALAB Consortium in Tsukuba has also decided to introduce a compact SR source "Helios" [4] from UK in 1995.…”

Section: M Andmentioning

confidence: 99%

Synchrotron radiation in Japan : status and new projects

Chikawa

1994

J. Phys. IV France

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“…The minimum detection limits (MDL) for zero displacement are shown for the same beam line for microprobe trace analysis in Fi~re 5. 1,8. Considering a sample size equivalent to the smallest excited volume, absolute MDL in the fg range can be obtained [30, 3 1].…”

mentioning

confidence: 99%