Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography

Smith, Henry I.; Menon, Rajesh; Patel, Amil; Chao, David; Walsh, Michael; Barbastathis, George

doi:10.1016/j.mee.2006.01.226

Cited by 48 publications

(23 citation statements)

References 12 publications

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“…Ye et al [12] have used LIL to create dual layer structures in one dimension (1D) as a polarizer and color filter. Zone-plate-array lithography (ZPAL) is a high throughput technique in which sub-region of a desired pattern can be written by multiple laser beamlets in parallel using an array of diffractive optical elements [13].…”

Section: Ag Hommentioning

confidence: 99%

Rapid production of structural color images with optical data storage capabilities

et al. 2015

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In this paper, we present novel methods to produce structural color image for any given color picture using a pixelated generic stamp named nanosubstrate. The nanosubstrate is composed of prefabricated arrays of red, green and blue subpixels. Each subpixel has nano-gratings and/or sub-wavelength structures which give structural colors through light diffraction. Micro-patterning techniques were implemented to produce the color images from the nanosubstrate by selective activation of subpixels. The nanosubstrate can contain nanohole arrays, which after replication are converted to nanopillar arrays or vice versa. We have demonstrated that both visible and invisible information can be easily stored using these fabrication methods and the information can be easily retrieved. Therefore the techniques can be employed to produce personalized and customized color images for applications in optical document security and publicity, and can also be complemented by combined optical data storage capabilities.

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Section: Ag Hommentioning

confidence: 99%

Rapid production of structural color images with optical data storage capabilities

et al. 2015

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“…SEBL is ideal for such research and development due to its patterning flexibility, high resolution, and ability to control feature dimensions via precise dose control. Other forms of maskless lithography currently under development that provide higher throughput than SEBL may be ideal for both research and moderate-volume manufacturing [3].…”

Section: Lithographymentioning

confidence: 99%

Strategies for fabricating strong-confinement microring filters and circuits

Smith

Barwicz

Holzwarth

et al. 2007

OFC/NFOEC 2007 - 2007 Conference on Optical Fiber Communication and the National Fiber Optic Engineers Conference

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“…[1][2][3][4][5] The diffraction limit 6 associated with all optical systems, has been circumvented by a number of techniques like self-aligned patterning techniques, 7,8 multiple exposure-and-etch mechanisms 9 and a number of other near-field methods [10][11][12][13] that have been inspired by techniques of super-resolution nanoscopy like stimulated-emission-depletion (STED).…”

Section: Introductionmentioning

confidence: 99%

Reverse-absorbance-modulation-optical lithography for optical nanopatterning at low light levels

et al. 2016

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A comprehensive simulation model of the performance of photochromic films in absorbance-modulationoptical-lithography AIP Advances 6, 035210 (2016); 10.1063/1.4944489Outdoor measurements of a photovoltaic system using diffractive spectrum-splitting and concentration AIP Advances 6, 095311 (2016) Absorbance-Modulation-Optical Lithography (AMOL) has been previously demonstrated to be able to confine light to deep sub-wavelength dimensions and thereby, enable patterning of features beyond the diffraction limit. In AMOL, a thin photochromic layer that converts between two states via light exposure is placed on top of the photoresist layer. The long wavelength photons render the photochromic layer opaque, while the short-wavelength photons render it transparent. By simultaneously illuminating a ring-shaped spot at the long wavelength and a round spot at the short wavelength, the photochromic layer transmits only a highly confined beam at the short wavelength, which then exposes the underlying photoresist. Many photochromic molecules suffer from a giant mismatch in quantum yields for the opposing reactions such that the reaction initiated by the absorption of the short-wavelength photon is orders of magnitude more efficient than that initiated by the absorption of the long-wavelength photon. As a result, large intensities in the ring-shaped spot are required for deep sub-wavelength nanopatterning. In this article, we overcome this problem by using the long-wavelength photons to expose the photoresist, and the short-wavelength photons to confine the "exposing" beam. Thereby, we demonstrate the patterning of features as thin as λ/4.7 (137nm for λ = 647nm) using extremely low intensities (4-30 W/m 2 , which is 34 times lower than that required in conventional AMOL). We further apply a rigorous model to explain our experiments and discuss the scope of the reverse-AMOL process. C 2016 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

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Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography

Cited by 48 publications

References 12 publications

Rapid production of structural color images with optical data storage capabilities

Rapid production of structural color images with optical data storage capabilities

Strategies for fabricating strong-confinement microring filters and circuits

Reverse-absorbance-modulation-optical lithography for optical nanopatterning at low light levels

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