XPS and XAES studies of as grown and nitrogen incorporated tetrahedral amorphous carbon films deposited by pulsed unfiltered cathodic vacuum arc process

Correlations between microstructure and hydrophobicity properties of pulsed laser deposited diamond-like carbon films

“…6(b) shows the variation of the FWHM of C1s peak of DLC films as a function of the substrate temperature. Decrease in the FWHM of C1s suggests that the sp 3 content decreases with increasing substrate temperature, which implies an increase in sp 2 content [41,42].…”

Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

“…The chemical composition and bond structure were analyzed by X-ray photoelectron spectroscopy (XPS) with ESCA 3600 (Shimadzu Co. Japan) spectrometer (photosource: Mg Ka (1253.6 eV) X-ray radiation, primary voltage: 20 kV, emission current: 20 mA, base pressure: 1 Â 10 À4 Pa). The nitrogen content in the nitrogenated ta-C film has been calculated by the area under the peak and the sensitivity values of N1s (0.38), C1s (0.205) and O1s (0.63) using the standard procedure [15]. The depth distribution profiles of a series of elements including N were determined by a field emission scanning Auger electron microprobe (model: AES PHI-680, Physical Electronics).…”

Investigations on phosphorous doped hydrogenated amorphous silicon carbide thin films deposited by a filtered cathodic vacuum arc technique for photo detecting applications

“…[36][37][38][39] It is a low voltage and high current (35V-50 V, 100 A) process. The cathodic vacuum arc is generally produced from the cold cathode whose material has to be deposited.…”