“…They also doped hydrogenated amorphous silicon carbide (P doped a-Si C:H) thin films deposited at room temperature by a FCVA technique using a phosphorus doped solid silicon target as a cathode in the presence of acetylene gas. These films have been characterized by X-ray diffraction (XRD), scanning electron microscopy, energy dispersive X-ray analysis, dark conductivity, activation energy, optical band gap, secondary ion mass spectroscopy, Raman spectroscopy, current-voltage, capacitancevoltage, and photoconductive measurements [20].…”