2018
DOI: 10.1109/ted.2018.2798710
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Write-Once-Read-Many-Times Characteristic of InZnO Oxide Semiconductor

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Cited by 17 publications
(11 citation statements)
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“…The plentiful Al cations induce an abrupt increase, and the rupture of the established conductive filaments by negative voltage is difficult to fully carry out (Figure c). Thus, the resistive switching is irreversible and the LRS can maintain stable even with a high negative voltage, exhibiting a superior WORM performance. For Al/ZnO NPs/CuO NWs/Cu based memristors, the abundant oxygen defects in ZnO NPs (XPS result as shown in Figure g) adsorbed on the surface of CuO NWs serve as holes or electron traps and provide acceptors for carriers. In this case, the trapping/detrapping effect under the electric field dominates the resistive switching behaviors instead of the Al conductive filament due to the low migration barrier of the electrons.…”
Section: Resultsmentioning
confidence: 99%
“…The plentiful Al cations induce an abrupt increase, and the rupture of the established conductive filaments by negative voltage is difficult to fully carry out (Figure c). Thus, the resistive switching is irreversible and the LRS can maintain stable even with a high negative voltage, exhibiting a superior WORM performance. For Al/ZnO NPs/CuO NWs/Cu based memristors, the abundant oxygen defects in ZnO NPs (XPS result as shown in Figure g) adsorbed on the surface of CuO NWs serve as holes or electron traps and provide acceptors for carriers. In this case, the trapping/detrapping effect under the electric field dominates the resistive switching behaviors instead of the Al conductive filament due to the low migration barrier of the electrons.…”
Section: Resultsmentioning
confidence: 99%
“…The effect of sputtering pressure was demonstrated recently by Simanjuntak et al [205]. The work reveals that devices developed with a low sputtering pressure show write-once-read-many-times (WORM, nonerasable) memory behaviours [206], [207]. In conclusion, those devices developed with a high sputtering pressure typically show reproducible switching behaviors (rewriteable, erasable) [202], [208].…”
Section: Effect Of Deposition Parametersmentioning
confidence: 65%
“…Today's WORM memory technology is based on the electrically or laser programmed fuse WORM type. However, in current WORM research, the emphasis was shifted to organic materials or solution process techniques in order to achieve rapid switching rate, lower power consumption,, large storage density, simplicity, and being cost-effective, which has been dubbed WORM RS [28,29]. Unlike ReRAM, the intrinsic features of WORM RS were sufficient to oppose the applied electric field, resulting in an irreversible shift.…”
Section: Write-once-read-many (Worm)mentioning
confidence: 99%