Wide continuous tuning range of 221 nm by InP/air-gap vertical-cavity filters

Hasse, A.; Irmer, S.; Daleiden, J.; Dharmarasu, N.; Hansmann, S.; Hillmer, Hartmut

doi:10.1049/el:20061303

Cited by 19 publications

(15 citation statements)

References 6 publications

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“…The third interferometric spectrometer is based on the Fabry–Pérot (FP) principle [ 4 , 27 , 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 , 36 , 37 , 38 , 39 , 40 , 41 , 42 , 43 , 44 , 45 , 46 , 47 , 48 , 49 , 50 , 51 , 52 , 53 , 54 , 55 , 56 , 57 ]. Although only two parallel transparent dielectric mirrors are involved, the FP interferometer is also highly complex and involves multipath interference.…”

Section: Introductionmentioning

confidence: 99%

Role of Nanoimprint Lithography for Strongly Miniaturized Optical Spectrometers

et al. 2021

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Optical spectrometers and sensors have gained enormous importance in metrology and information technology, frequently involving the question of size, resolution, sensitivity, spectral range, efficiency, reliability, and cost. Nanomaterials and nanotechnological fabrication technologies have huge potential to enable an optimization between these demands, which in some cases are counteracting each other. This paper focuses on the visible and near infrared spectral range and on five types of optical sensors (optical spectrometers): classical grating-based miniaturized spectrometers, arrayed waveguide grating devices, static Fabry–Pérot (FP) filter arrays on sensor arrays, tunable microelectromechanical systems (MEMS) FP filter arrays, and MEMS tunable photonic crystal filters. The comparison between this selection of concepts concentrates on (i) linewidth and resolution, (ii) required space for a selected spectral range, (iii) efficiency in using available light, and (iv) potential of nanoimprint for cost reduction and yield increase. The main part of this review deals with our own results in the field of static FP filter arrays and MEMS tunable FP filter arrays. In addition, technology for efficiency boosting to get more of the available light is demonstrated.

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Section: Introductionmentioning

confidence: 99%

Role of Nanoimprint Lithography for Strongly Miniaturized Optical Spectrometers

et al. 2021

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“…Research on highly efficient and compact tunable Fabry-Pérot filter devices ( Fig. 1) has been reported by using this technology approach [2][3][4]. Polarization selectivity can be added to these spectral membrane filters by introducing a periodic structure.…”

Section: Introductionmentioning

confidence: 99%

Processing of photonic crystals in InP membranes by focused ion beam milling and plasma etching

Kusserow

Wulf

Zamora

et al. 2013

Microelectronic Engineering

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“…Such DBRs are necessarily made as microstructures, because of constraints posed by finite etch rates and mechanical stability of the completed air-gap structure. Examples taking advantage of relatively mature growth and processing include tunable InP-air DBRs for nearinfrared telecommunication wavelengths [1][2][3]. Development of sacrificial layer technologies has proved more challenging for wide bandgap III-nitride semiconductors, and progress to 2007 was covered in an extensive review [4].…”

Section: Introductionmentioning

confidence: 99%

High-reflectivity GaN/air vertical distributed Bragg reflectors fabricated by wet etching of sacrificial AlInN layers

Xiong¹,

Edwards²,

Christmann³

et al. 2010

Semicond. Sci. Technol.

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Microstructures containing GaN/air distributed Bragg reflector (DBR) regions were fabricated by a selective wet etch to remove sacrificial AlInN layers from GaN-AlInN multilayers. The epitaxial multilayers were grown on free-standing GaN substrates, and contained AlInN essentially lattice matched with GaN in order to minimize strain. Two geometries were defined for study by standard lithographic techniques and dry etching: cylindrical pillars and doubly anchored rectangular bridges. Microreflectivity spectra were recorded from the air-gap DBRs, and indicated peak reflectivities exceeding 70% for a typical 3-period microbridge. These values are likely to be limited by the small scale of the features in comparison with the measurement spot. The stopband in this case was centred at 409 nm, and the reflectivity exceeded 90% of the maximum over 73 nm. Simulations of reflectance spectra, including iterations to layer thicknesses, gave insight into the tolerances achievable in processing, in particular indicating bounds on the parasitic removal of GaN layers during wet etching. Air-gap nitride DBRs as described can be further developed in various ways, including adaptation for electrostatic tuning, incorporation into microcavities, and integration with active emitters.

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Wide continuous tuning range of 221 nm by InP/air-gap vertical-cavity filters

Cited by 19 publications

References 6 publications

Role of Nanoimprint Lithography for Strongly Miniaturized Optical Spectrometers

Role of Nanoimprint Lithography for Strongly Miniaturized Optical Spectrometers

Processing of photonic crystals in InP membranes by focused ion beam milling and plasma etching

High-reflectivity GaN/air vertical distributed Bragg reflectors fabricated by wet etching of sacrificial AlInN layers

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