Processing of photonic crystals in InP membranes by focused ion beam milling and plasma etching

Kusserow, Thomas; Wulf, Matthias; Zamora, Ricardo; Kanwar, K.; Hillmer, Hartmut

doi:10.1016/j.mee.2012.02.019

Cited by 10 publications

(8 citation statements)

References 13 publications

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“…When fabricating a system that incorporates both of these, care must be taken to protect areas from being undercut when not intended. Changing geometry or depositing protective dielectrics are common techniques used to realize this; [121] however, one can use the material alloying to obtain different absorber layer compositions which have a higher etch selectivity to the sacrificial etchant. This is often not 100% selective so some parasitic damage is to be expected [26].…”

Section: Discussionmentioning

confidence: 99%

Fabrication challenges for indium phosphide microsystems

Siwak

Fan

Ghodssi

2015

J. Micromech. Microeng.

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From the inception of III-V microsystems, monolithically integrated device designs have been the motivating drive for this field, bringing together the utility of single-chip microsystems and conventional fabrication techniques. Indium phosphide (InP) has a particular advantage of having a direct bandgap within the low loss telecommunication wavelength (1550 nm) range, able to support passive waveguiding and optical amplification, detection, and generation depending on the exact alloy of In, P, As, Ga, or Al materials. Utilizing epitaxy, one can envision the growth of a substrate that contains all of the components needed to establish a single-chip optical microsystem, containing detectors, sources, waveguides, and mechanical structures. A monolithic InP MEMS system has, to our knowledge, yet to be realized due to the significant difficulties encountered when fabricating the integrated devices. In this paper we present our own research and consolidate findings from other research groups across the world to give deeper insight into the practical aspects of InP monolithic microsystem development: epitaxial growth of InP-based alloys, etching techniques, common MEMS structures realized in InP, and future applications. We pay special attention to shedding light on considerations that must be taken when designing and fabricating a monolithic InP MEMS device.

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Section: Discussionmentioning

confidence: 99%

Fabrication challenges for indium phosphide microsystems

Siwak

Fan

Ghodssi

2015

J. Micromech. Microeng.

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“…Focused Ion Beam is a microscopy technique which can both image and structure surface of the materials -see figure 1, with the smallest spot size of 2.5 nm it is possible to manufacture very complex nanostructures in almost any inorganic conductive and unconductive materials [7][8][9][10][11][12] To improve the quality of surface imaging and the crystal patterning, the samples were covered with a 10 -20 nm layer of chromium which was removed afterwards. To figure out all the parameters of the FIB procedure, we had to conduct a series of quality and time optimization experiments.…”

Section: Focused Ion Beam Samples Productionmentioning

confidence: 99%

“…The technique is perfectly adequate as a fastprototyping method with a very direct path from computer simulations of the photonic pattern to first working prototypes. Because of those benefits FIB technique has been used for prototyping of both electrical and optical based nanostructure devices [7][8][9][10]. The FIB machine is a device similar to a SEM (scanning electron microscope), but it uses ions (mainly gallium) instead of electrons.…”

Section: Introductionmentioning

confidence: 99%

“…The FIB machine is a device similar to a SEM (scanning electron microscope), but it uses ions (mainly gallium) instead of electrons. For imaging purposes, the FIB operates at small currents (pA) [10][11][12], while for the patterning of surfaces in nano-scale uses high currents (nA) [7][8][9][10][11][12]. We have produced three prototype samples using FIB patterning.…”

Section: Introductionmentioning

confidence: 99%

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Light Extraction From Scintillating Crystals Enhanced by Photonic Crystal Structures Patterned by Focused Ion Beam

Modrzynski

Gotszalk

Knapitsch

et al. 2016

IEEE Trans. Nucl. Sci.

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Abstract-Photonic Crystals have been used in a variety of fields as a structure for improving the light extraction efficiency from materials with high index of refraction. In previous work we already showed the light extraction improvement of several PhC covered LYSO crystals in computer simulations and practical measurements. In this work, new samples are made using different materials and techniques which allows further efficiency improvements. For rapid prototyping of PhC patterns on scintillators we tested a new method using FIB (Focused Ion Beam) patterning. The FIB machine is a device similar to a SEM microscope, but it uses ions (mainly gallium) instead of electrons for the imaging of the samples' surface. The additional feature of FIB devices is the option of surface patterning in nano-scale which was exploited for our samples. Three samples using FIB patterning have been produced. One of them is a direct patterning of the extraction face of a 0.8 x 0.8 x 10 mm 3 LYSO crystal. The second and third were TiO 2 coated LYSO crystal with a 1.4 x 1.4 mm 2 out coupling face partly covered with highquality photonic crystals. TiO 2 has high refractive index (around 2.1 -2.4) -which shows the best results in our light extraction simulations. In this paper, scanning electron microscopy (SEM) images of the samples will be presented together with measurements of excited crystals which show unrivalled performance for such scintillator samples.Patterning of all crystals was performed in the laboratory

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“…FIB processing is an ideal tool regarding rapid testing and prototyping with high resolution. However, the low milling rates and charging effects of dielectric oxides may have some disadvantages for certain applications and a process combining hardmask structurering with dry etching [10] respectively introducing fs laser pulse processing is currently developed by us to optimize device quality and process time. …”

Section: Technological Device Fabricationmentioning

confidence: 99%

Guided-mode resonances in dielectric photonic crystal slabs with low index contrast

Kusserow

Khan

Zamora

et al. 2012

2012 International Conference on Optical MEMS and Nanophotonics

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We present nanophotonic structures consisting of a dielectric slab waveguide with low index contrast and photonic crystals. The guided-mode resonance effect is used to implement elements with selective reflection properties. The design procedure, including numerical simulations, as well as a fabrication approach employing a focused ion beam system is described. Finally, a device layout with DBR mirrors to reduce lateral losses is discussed.

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Processing of photonic crystals in InP membranes by focused ion beam milling and plasma etching

Cited by 10 publications

References 13 publications

Fabrication challenges for indium phosphide microsystems

Fabrication challenges for indium phosphide microsystems

Light Extraction From Scintillating Crystals Enhanced by Photonic Crystal Structures Patterned by Focused Ion Beam

Guided-mode resonances in dielectric photonic crystal slabs with low index contrast

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