2017
DOI: 10.1002/admi.201601223
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Water‐Based Photo‐ and Electron‐Beam Lithography Using Egg White as a Resist

Abstract: human life. [1][2][3] To achieve such a dream, choosing natural biomaterials such as nucleic acids, [4][5][6] peptides, [7] proteins, [8,9] and polysaccharides [10] as the substitutes of fossil source-based synthetic chemicals is a promising way. Correspondingly, micro/ nanoscale fabrication on natural biomaterials receives great of importance, [11] and a spatially definable property with high precision to exactly position biomaterials on a surface is highly desirable [12][13][14][15][16][17][18] toward biodeg… Show more

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Cited by 26 publications
(28 citation statements)
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References 73 publications
(103 reference statements)
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“…Under low‐irradiation doses (3,000 and 1,500 μC/cm), photolithography and electron beam direct writing on spin‐coated egg white layers can produce effective complex micro‐ and nanopatterns (Figure 3). 80 …”
Section: Application To Biomaterialsmentioning
confidence: 99%
“…Under low‐irradiation doses (3,000 and 1,500 μC/cm), photolithography and electron beam direct writing on spin‐coated egg white layers can produce effective complex micro‐ and nanopatterns (Figure 3). 80 …”
Section: Application To Biomaterialsmentioning
confidence: 99%
“…Furthermore, these nanofabrication processes require an ultralow operating temperature, including a specially designed heating/cooling stage, and an ultrahigh vacuum environment, which is costly and incompatible with serial semiconductor manufacturing techniques. Another promising avenue for renewable resists comes from biomacromolecules, which include silk, [ 12–14 ] wool keratin, [ 17 ] egg white, [ 15 ] spider silk, [ 16 ] and various polysaccharides. [ 18–21 ] Despite some inspiring success with these materials, protein‐based resists lack replication fidelity given their ambiguous composition and unpredictable molecular weight and distribution.…”
Section: Introductionmentioning
confidence: 99%
“…resources to replace the current petroleum-based resists, which are key materials in the semiconductor industry and are critical components of several emerging technologies from nanofluidic devices to quantum computing and artificial intelligent systems. [3] Toward this aim, ice, [4][5][6][7] dry ice, [8] small organic molecules, [9][10][11] and bio-based macromolecules [12][13][14][15][16][17][18][19][20][21] have been developed as burgeoning materials for micro-/nanomanufacturing via photo or electron beam lithography owing to their intrinsic renewability or recyclability. Although these sustainable resists have shown tremendous promise, questions remain concerning sensitivity, reproducibility, and compatibility with current lithographic protocols, as well as scaleup.…”
mentioning
confidence: 99%
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“…With silk, although high resolution was also achieved (30 nm lines spaced by 100 nm for e-beam), selectivity to etching was not reported. Recently, a third group proposed egg white directly extracted from eggs as a resist 12 . But stripping of this resist was time consuming as the sample needed to be immersed in a solution of trypsin during 15 h which is not suited to a microelectronic process.…”
Section: Introductionmentioning
confidence: 99%