Wafer-Scale Performance Mapping of Magnetron-Sputtered Ternary Vanadium Tungsten Nitride for Microsupercapacitors

Abstract

To power Internet-of-Things applications, new materials are currently being investigated as efficient electrodes for microsupercapacitors. In recent years, multicationic materials were demonstrated to be an attractive new class of materials for electrodes. In this study, we deposited vanadium tungsten nitride by cosputtering. Our film shows excellent electrochemical performance, a capacitance of 700 F•cm −3 , and no loss in capacitance retention after 5000 cycles. In addition, the properties of the film were investigated in many aspects using advanced characterization and mapping techniques. Our approach opens new perspectives and provides a powerful characterization tool for electrochemical materials.

Ti–Cr–N Nanopyramid/Nitrogen-Doped Carbon Quantum Dot/Stainless Steel Mesh as a Flexible Supercapacitor Electrode

“…Noteworthy, Wei et al fabricated a Ti–Nb–N thin-film electrode and obtained an impressive specific areal capacitance of 59.3 mF·cm –2 alongside greater cycle stability owing to the significant synergy of NbN and TiN . Likewise, Dinh et al synthesized magnetron cosputtered V–W–N thin-film electrodes and obtained a greater specific capacitance of 700 F·cm –3 without any degradation until 5000 cycles . Furthermore, previously reported Ti–V–N thin-film electrodes display a particular capacitance of 15 mF·cm –2 with an exceptional 10 000 cycles, investigated by Achour et al Among various nitrides, CrN has exhibited robust capacitance numbers, featuring multiple oxidation states, exceptional electrical conductivity (4000–55 000 S·cm –1 ), extensive vast surface area, and superb intercalation chemistry. − However, the participation of faradaic processes in the CrN material drastically limits its cycle life .…”