Wafer-Level Hybrid Integration of Complex  Micro-Optical Modules

Dannberg, Peter; Wippermann, Frank; Brückner, Andreas; Matthes, A.; Schreiber, Peter; Bräuer, Andreas

doi:10.3390/mi5020325

Cited by 28 publications

(10 citation statements)

References 28 publications

(33 reference statements)

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“…Second, the master for the slide structure is manufactured and the slide layer is composed of lithographically patterned and wet-etched chromium 3,4 .…”

Section: Fabricationmentioning

confidence: 99%

Array projector design for projection on arbitrarily curved surfaces

Fischer

Schreiber

Riedel³

et al. 2015

SPIE Proceedings

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The micro-optical array projector is a new and innovative possibility to project patterns onto arbitrary shaped surfaces1 . In contrast to single-aperture systems the illuminance of the projected image is raised by only increasing the lateral extent of the projector while keeping the length constant. Thanks to the setup - analogous to a fly’s eye condenser – we obtain a very compact design with homogenization of illumination. The images to be projected are presented as arbitrarily curved CAD-objects. Because of its complexity, the first attempt was a chief-ray backtrace implemented into a CAD-program, with the individual projectorlets modelled as pinhole cameras. With this principle one can trace the slides for several applications like the projection on perpendicular, as well as tilted and curved surfaces. Since aberrations cannot be considered with the simple CAD backtrace described above, we used the commercially available raytracer Zemax®, controlled by a macro, working in conjunction with a CADprogram for improved slide mask generation. Despite both methods, depending on the complexity of the optical system, are generating the fundamental mask data, the paper will show that there is a tradeoff between calculation time and accuracy. Based on this evaluation we will discuss further development as well as the possibility of improvement concerning the calculation methods. The different methods were investigated to determine their advantages and disadvantages. This provides the basis for the scope of application. Further we will demonstrate simulations as well as results obtained with built demonstrators

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“…Second, the master for the slide structure is manufactured and the slide layer is composed of lithographically patterned and wet-etched chromium 3,4 .…”

Section: Fabricationmentioning

confidence: 99%

Array projector design for projection on arbitrarily curved surfaces

Fischer

Schreiber

Riedel³

et al. 2015

SPIE Proceedings

Self Cite

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show abstract

“…This can realize wedge errors in the range of 2-6 lm (4 00 wafer) and an absolute gap precision in the range of some micrometers. Focusing on imprint [114] instead of proximity lithography, a commercial mask aligner with real-time gap measurement and piezo actuators for substrate leveling has been introduced in 2007 by Suss MicroTec [115,116]. This tool is equipped with ruler-based length gauges between mask holder and chuck which are calibrated during the mechanical three-point spacer balancing to monitor the mask to substrate separation.…”

Section: Wedge Error Compensationmentioning

confidence: 99%

High-resolution proximity lithography for nano-optical components

Stuerzebecher

Fuchs

Zeitner

et al. 2015

Microelectronic Engineering

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“…An example of the trend towards miniaturization and hybridization is the lithographic fabrication of micro-lens arrays for multi-spot illumination or multi-aperture detectors. Photoresist reflow method is employed to create micro-lenses with a subsequent laser writing step used to inscribe a di↵ractive phase correction element [4]. Such hybridization is pursued either to circumvent limitations in fabrication method, as in the aforementioned example, or when additional flexibility is required for specific fields.…”

Section: Introductionmentioning

confidence: 99%

Hybrid curved nano-structured micro-optical elements

Balčytis¹,

Hakobyan²,

Gabalis³

et al. 2016

Opt. Express

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Tailoring the spatial degree of freedom of light is an essential step towards the realization of advanced optical manipulation tools. A topical challenge consists of device miniaturization for improved performance and enhanced functionality at the micron scale. We demonstrate a novel approach that combines the additive three-dimensional (3D) structuring capability of laser polymerization and the subtractive subwavelength resolution patterning of focused ion beam lithography. As a case in point hybrid (dielectric/metallic) micro-optical elements that deliver a well-defined topological shaping of light are produced. Here we report on hybrid 3D binary spiral zone plates with unit and double topological charge. Their optical performances are compared to corresponding 2D counterparts both numerically and experimentally. Cooperative refractive capabilities without compromising topological beam shaping are shown. Realization of advanced designs where the dielectric architecture itself is endowed with singular properties is also discussed.

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Wafer-Level Hybrid Integration of Complex Micro-Optical Modules

Cited by 28 publications

References 28 publications

Array projector design for projection on arbitrarily curved surfaces

Array projector design for projection on arbitrarily curved surfaces

High-resolution proximity lithography for nano-optical components

Hybrid curved nano-structured micro-optical elements

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