2013
DOI: 10.1364/oe.21.018236
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Vertical integration of high-Q silicon nitride microresonators into silicon-on-insulator platform

Abstract: We demonstrate a vertical integration of high-Q silicon nitride microresonators into the silicon-on-insulator platform for applications at the telecommunication wavelengths. Low-loss silicon nitride films with a thickness of 400 nm are successfully grown, enabling compact silicon nitride microresonators with ultra-high intrinsic Qs (~ 6 × 10(6) for 60 μm radius and ~ 2 × 10(7) for 240 μm radius). The coupling between the silicon nitride microresonator and the underneath silicon waveguide is based on evanescent… Show more

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Cited by 61 publications
(37 citation statements)
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References 28 publications
(33 reference statements)
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“…In fact, this tunability has already been studied in passive SiN disks [2,3,16]. In active devices it is of practical importance, e.g.…”
Section: Tunability On the Coupling Strength Of Disk Pl To Bus Waveguidementioning
confidence: 99%
See 1 more Smart Citation
“…In fact, this tunability has already been studied in passive SiN disks [2,3,16]. In active devices it is of practical importance, e.g.…”
Section: Tunability On the Coupling Strength Of Disk Pl To Bus Waveguidementioning
confidence: 99%
“…Silicon nitride (SiN), due to its fairly high optical index (~2.0), broad operating wavelength range, and compatibility with complementary metal-oxide-semiconductor (CMOS) processing technology, is a promising material as the basis for an integrated optics platform [1][2][3][4][5].…”
Section: Introductionmentioning
confidence: 99%
“…Various plasma chemistries, such as CF 4 [1], CF 4 /CHF 3 [2], C 4 F 8 /SF 6 /H 2 [7], CHF 3 /O 2 [8], and CF 4 /H 2 [16], have already been used to obtain anisotropic etching in SiN. However, unlike what is the case for SiN-films deposited in a single step, due to the considerable difference in material density the etching behavior between H-SiN and L-SiN deposited on top of each other can vary a lot.…”
Section: Optimization Of Dry Etching For H-sin/l-sin and H-sin/qds/l-mentioning
confidence: 99%
“…Silicon nitride (SiN) exhibits transparency from the visible to the mid-infrared and has a fairly high optical index (~2.0), making it suitable for various photonic applications including integrated photonic circuits [1][2][3][4], nonlinear optics [5], high quality optical cavities [6][7][8], and on-chip biosensing [9]. On the other hand, because of its dielectric nature, the SiN platform is thus far limited to passive devices and a light source such as a laser or a single photon emitter integrated in this platform is highly desired.…”
Section: Introductionmentioning
confidence: 99%
“…Given its moderate optical index (~2.0), broad operating wavelength range and low-loss, silicon nitride (SiN) photonics is a promising platform for various applications including integrated photonic circuits [1], nonlinear optics [2], and onchip biosensing [3]. On the other hand, because of its dielectric nature, SiN devices have thus far been limited to passive functionalities and an optically active SiN photonics platform is highly desired.…”
Section: Introductionmentioning
confidence: 99%