UV crystallization of poly-si using a CeO2 seed layer on plastic substrate for microelectronics applications

Study on the initial growth process of crystalline silicon films on aluminum-coated polyethylene napthalate by Raman spectroscopy

“…And it is exciting that some successful models have been proposed to explain the formation process of crystalline silicon films: (1) surface diffusion model [8,9], (2) etching model [10] and (3) chemical annealing model [11]. Meanwhile, because of the light weight and flexibility demanded in modern solar cells and personal information displays, such as e-books, cellular phones, the preparation of high-quality crystalline silicon thin films on plastic has been attracting much attention the recent years [12][13][14][15]. And some approaches have been proposed to manufacture crystalline silicon on polymer substrates, such as laser annealing crystallization of amorphous silicon films [14,16] and the deposition of crystalline silicon films assisted with the appropriate substrate temperature, about 100 1C or more, in plasma chemical vapor deposition (CVD) processes [12,14,17,18].…”

“…Meanwhile, because of the light weight and flexibility demanded in modern solar cells and personal information displays, such as e-books, cellular phones, the preparation of high-quality crystalline silicon thin films on plastic has been attracting much attention the recent years [12][13][14][15]. And some approaches have been proposed to manufacture crystalline silicon on polymer substrates, such as laser annealing crystallization of amorphous silicon films [14,16] and the deposition of crystalline silicon films assisted with the appropriate substrate temperature, about 100 1C or more, in plasma chemical vapor deposition (CVD) processes [12,14,17,18]. However, some drawbacks in the above-mentioned approaches severely block the preparation of high-quality crystalline silicon films on plastic substrates.…”

Deposition and field emission properties of highly crystallized silicon films on aluminum-coated polyethylene napthalate

“…They have been used in solar cells, thin film transistors, imaging sensors and large-area flat displays. Meanwhile, because of the light weight and flexibility demanded in modern personal information displays, such as e-books, cellular phones, the preparation of high-quality crystalline silicon thin films on plastic has been attracting much attention in these years [4][5][6][7]. To date, two approaches are used to manufacture crystalline silicon films on plastic, i.e.…”

“…To date, two approaches are used to manufacture crystalline silicon films on plastic, i.e. laser annealing crystallization (LAC) of amorphous silicon films [6,8] and the deposition of crystalline silicon films assisted with the appropriate substrate temperature, about 100 1C or more, in plasma chemical vapor deposition (CVD) process [4,6,9,10]. However, some drawbacks in the above-mentioned approaches severely block the preparation of high-quality crystalline silicon films on plastic substrates.…”

“…At the same time, in order to decrease the bombardment of positive ions and increase the crystallinity of silicon films, the substrates were usually coated by CeO 2 , etc. conductive layers because of the match of crystal lattices between them and crystalline silicon [6].…”