“…For low values of drain voltage V ds , following the study in [9][10][11][12], and applying the boundary conditions ((2a), (2b), (2c) and ∂ψ/∂r = 0, the symmetry condition of the structure, for r = 0), when the ratio of channel length (L) silicon thickness (t si ) is >2 and t si > 5 nm, the potential distribution, ψ(r, z), in the thin silicon film can be represented as a second-order parabolic function along the radial (r) direction:…”