Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography

Abstract

A general, one-step patterning technique for colloidal quantum dots by direct optical or e-beam lithography. Photons (5.5–91.9 eV) and electrons (3 eV–50 kV) crosslink and immobilize QDs down to tens of nm while preserving the luminescent properties.

Direct Patterning of CsPbBr3 Nanocrystals via Electron-Beam Lithography

“…Overall, we hypothesize that the long ligands, oleylamine and oleic acid, partly cross-link upon exposure, as observed before. 22 Figure 6 b shows possible cross-linking pathways. The high energy of the incoming electrons can create free electrons with a broad range of energies.…”

“…In previous work, we showed a method to pattern colloidal quantum dots (CQDs) directly by extreme UV lithography (EUVL) or e-beam lithography (EBL) without affecting their luminescent properties significantly. 22 In this work, we expanded this method to include perovskite nanocrystals and show that these crystals can also be patterned to create structures down to 100s of nanometers that still show luminescence.…”

Ternary Quantum Dots in Chemical Analysis. Synthesis and Detection Mechanisms

“…Different QDs with specific structures can be obtained applying these technologies, such as nanowires [ 17 ], circular [ 18 ], and pyramid-shaped nanoparticles [ 19 ] in a large range of sizes (3–50 nm but commonly of 30 nm). QDs synthesized by these methodologies are used mainly for photovoltaic applications, optoelectronics (LEDs), and energy storage in solar cells [ 16 ].…”

Polarization-based colour tuning of mixed colloidal quantum-dot thin films using direct patterning

“…Several direct patterning strategies for cQD thin films have been developed in recent years. Examples include the use of direct lithography onto the film, 9–12 using electron-beam or optical lithography techniques. In addition, different printing techniques have shown high-resolution patterning.…”