Unipolar and bipolar mode of deep oscillation magnetron sputtering

Abstract

The paper presents the results of a study of the modes of dual deep oscillation magnetron sputtering. The use of packet pulse discharge power supply allowed to provide a high power density on the surface of the Al target 60–500 W·cm−2 and the ion current density on the substrate 4–20 mA·cm−2 during the duration of the macro pulse – 1 ms. In addition to the parameters of a pulsed power supply, the way of connecting the power source to the dual magnetron sputtering system and the vacuum chamber changed during the experiments. Targets of the magnetron sputtering system were isolated from the chamber or alternately connected to it. A change in the connection method led to a change in the anode area and such discharge parameters as: discharge current, plasma concentration, bias voltage, and ion current density on the substrate. It is shown that in the mode with a small area of the anode, the substrate is exposed to a higher energy impact in comparison with the regime when the anode had a large area.

Поток энергии на подложку в процессе дуального магнетронного осаждения покрытий TiAlN

“…Важными достоинствами обладают дуальные МРС, которые питаются переменным током. Они решают проблему потери анода и позволяют увеличить ионное воздействие на растущее покрытие по сравнению с одиночными МРС [8]. Ионная бомбардировка подложки в процессе напыления является эффективным инструментом управления энергией, передаваемой покрытию.…”

Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

“…Both of these techniques have been proposed as new methods to increase the deposition rate by avoiding arcs in DOMS and reducing metal ion back-attraction in m-HiPIMS. Furthermore, very recently, bipolar-DOMS has been developed as a new method that combines the elements of DOMS and m-HiPIMS [22,23].…”

Properties of millisecond-scale modulated pulsed power magnetron discharge applied for reactive sputtering of zirconia

“…It has been shown that in some cases of high-power pulsed reactive sputtering processes, the hysteresis effects tend to mitigate, thus alleviating the requirements for gas supply control systems, while in others they do not appear at all [24,27,28], which is beneficial for coating deposition applications. However, the challenges for stable efficient deposition processes of high-quality compound (and especially transparent oxide) thin films still remain and stimulate refining of the pulsed magnetron techniques as well as developing of the novel ones [e.g., deep oscillation magnetron sputtering (DOMS) [29][30][31][32][33]].…”