2004
DOI: 10.1021/nl049285u
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Uniform Nanoscopic Polystyrene Patterns Produced from a Microscopic Mold

Abstract: We demonstrate a molded dewetting (MD) process that is capable of producing highly regular and reproducible nanoscopic polymer patterns using a microscopic patterned mold. Theoretical simulations confirm that this MD process does not rely on specific interactions between the polymer and the substrate or the mold, hence it can be used for general purpose patterning. This nanoscale patterning method can also be combined with other approaches such as microcontact printing to produce complex structures.

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Cited by 39 publications
(39 citation statements)
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“…In the transfer process, HDT molecules that exist between the wells are also printed to the contacting regions of the glass surface. According to the computer simulation by Bucknall and co-workers, [16] it is supposed that the guided dewetting can confine the DA-PEG fluids in the regions absent of HDT. Owing to this feature, wettability controlled self-assembly has been chosen to fill the microwells and to control the ring topology, although other methods such as spin coating and withdrawing the stamp vertically from a solution have also been used before.…”
Section: Resultsmentioning
confidence: 99%
“…In the transfer process, HDT molecules that exist between the wells are also printed to the contacting regions of the glass surface. According to the computer simulation by Bucknall and co-workers, [16] it is supposed that the guided dewetting can confine the DA-PEG fluids in the regions absent of HDT. Owing to this feature, wettability controlled self-assembly has been chosen to fill the microwells and to control the ring topology, although other methods such as spin coating and withdrawing the stamp vertically from a solution have also been used before.…”
Section: Resultsmentioning
confidence: 99%
“…In the latter case, a meniscus is observed at the protruding end of the polymer as shown in Fig. 1b; if combined with a "moulded dewetting" process, 19 further annealing could allow the meniscus film to fully dewet from the centre of the meniscus which forms the thinnest part of the film (Fig. 2).…”
Section: Thickness Of Polymer Filmsmentioning
confidence: 99%
“…However, by combining with other techniques, much higher resolution could be obtained. 9 In this work, a method combining µCP with self-assembly of nanoparticles at liquid/liquid interface is applied to produce highly ordered array patterns with feature size smaller than that on the stamps. In this method, µCP is used to create chemical patterns on substrates, which induce selective condensation of water droplets.…”
Section: Introductionmentioning
confidence: 99%